Surface Study of Nb/Cu Films for Cavity Deposition by ECR Plasma

Wu, Andy; Ike, Robert; Phillips, H.L.; Valente, Anne-Marie; Wang, H.; Wu, Genfa

doi:10.1109/pac.2005.1591748

Cited by 2 publications

(1 citation statement)

References 4 publications

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“…Those samples were produced by a small independent ECR plasma coating system. Tc and RRR measurements and the surface study results from TEM, SEM, SIMS and 3-D profilometry have been reported [10] and will be updated [11] seperately. The RF surface impedance of small samples are to be measured on a TE011 cavity [12].…”

Section: Introductionmentioning

confidence: 99%

Niobium Thin Film Coating on A 500-MHz Copper Cavity by Plasma Deposition

Wang

Wu²,

Phillips³

et al.

Proceedings of the 2005 Particle Accelerator Conference

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A system using an Electron Cyclotron Resonance (ECR) plasma source for the deposition of a thin niobium film inside a copper cavity for superconducting accelerator applications has been designed and is being constructed. The system uses a 500-MHz copper cavity as both substrate and vacuum chamber. The ECR plasma will be created to produce direct niobium ion deposition. The central cylindrical grid is DC biased to control the deposition energy. This paper describes the design of several subcomponents including the vacuum chamber, RF supply, biasing grid and magnet coils. Operational parameters are compared between an operating sample deposition system and this system. Engineering progress toward the first plasma creation will be reported here.

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Section: Introductionmentioning

confidence: 99%

Niobium Thin Film Coating on A 500-MHz Copper Cavity by Plasma Deposition

Wang

Wu²,

Phillips³

et al.

Proceedings of the 2005 Particle Accelerator Conference

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The investigation of chemical vapor deposited copper-based niobium films

Li¹,

Guo²,

Luo³

et al. 2021

Mater. Res. Express

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The deposition of niobium film on copper with excellent superconducting property at low-temperature conditions, used as superconducting radio frequency (SRF) cavity, is a serious and urgent technical problem to be solved at present. In this work, copper-based niobium (Nb) films with a thickness of 1.5–1.8 um, regulating the deposition temperature parameters and gas flow velocity in a tube furnace, were prepared by low-temperature chemical vapor depositing (CVD) method from the reaction between H2 and Niobium chloride (NbCl5) under pure Ar atmosphere. Fabricated Nb films were characterized by X-ray diffraction, scanning electron microscopy and energy dispersive spectroscopy, respectively. The results showed that the excellent crystalline quality and superconductive performance of Nb films were generated successfully by CVD at low temperatures of 650 °C–700 °C. The preparation process was optimized during deposition and the formation mechanism of Nb films was also discussed in detail. The magnetic moment versus temperature of the Nb sample prepared at 700 °C was also measured and the well-prepared Nb film deposited in the boundary layer region obtains the desired superconducting transition temperature of 9.1 K ± 0.1 K, almost equivalent to that of high pure Nb bulk material. The optimized CVD reaction method of Nb film with favorable morphology and expected superconductive property at low temperature provided a new strategy and technical process in designing the desired copper-based Nb film SRF cavity.

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Surface Study of Nb/Cu Films for Cavity Deposition by ECR Plasma

Cited by 2 publications

References 4 publications

Niobium Thin Film Coating on A 500-MHz Copper Cavity by Plasma Deposition

Niobium Thin Film Coating on A 500-MHz Copper Cavity by Plasma Deposition

The investigation of chemical vapor deposited copper-based niobium films

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