2011
DOI: 10.1016/j.jelechem.2011.04.021
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Surface structure and electrochemical characteristics of boron-doped diamond exposed to rf N2-plasma

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Cited by 17 publications
(8 citation statements)
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“…However, high plasma powers can lead to extensive dissociation of the ammonia molecules, leading to the formation of cyano groups, amino groups, and other forms of surface nitrogen that are not easy to protonate to form positively charged surface groups. [21,44]. Wei and co-workers reported good results using a microwave plasma, optimized at powers much lower than those typically used for diamond growth [21].…”
Section: Discussionmentioning
confidence: 99%
“…However, high plasma powers can lead to extensive dissociation of the ammonia molecules, leading to the formation of cyano groups, amino groups, and other forms of surface nitrogen that are not easy to protonate to form positively charged surface groups. [21,44]. Wei and co-workers reported good results using a microwave plasma, optimized at powers much lower than those typically used for diamond growth [21].…”
Section: Discussionmentioning
confidence: 99%
“…Typically, nitrogen is incorporated into diamond films using activated species, either during the deposition or by post‐deposition processes. The former method consists of introducing N 2 or NH 3 gas during the chemical vapor deposition (CVD) process and the latter method includes low energy N + ion implantation or nitrogen plasma exposure . Among the post‐deposition processes, N + ion implantation is the most popular and widely used method.…”
Section: Introductionmentioning
confidence: 99%
“…The former method consists of introducing N 2 or NH 3 gas during the chemical vapor deposition (CVD) process and the latter method includes low energy N þ ion implantation or nitrogen plasma exposure [16][17][18][19][20][21]. Among the post-deposition processes, N þ ion implantation is the most popular and widely used method.…”
mentioning
confidence: 99%
“…It must be emphasized that in all cases, the maximum amounts of superficial nitrogen and identified amine groups remain low, e.g. 6% [67], 7.4 % [69], 3% [71], and in addition found to be evenly distributed on the surface [68]. The measured amounts by the electrochemical technique designed in this work yield thus low values but one can anticipate improved performances by tuning the deposition conditions, namely by adding ammonia to the sputtering gas at the end of the growth to increase amination of the surface.…”
Section: Discussionmentioning
confidence: 94%
“…Finally, it is also worthwhile to compare the efficiency of the « natural amination » described in this work by magnetron sputtering in the course of a-CN x elaboration, to the "purposely amination" done by different techniques after synthesis of BDD surfaces: either N 2 [66,67] or NH 3 [68,69] plasma treatments, UV treatments under NH 3 atmosphere [70], or electrochemical treatments in liquid NH 3 [71][72].…”
Section: Discussionmentioning
confidence: 99%