Surface-relief gratings with high spatial frequency fabricated using direct glass imprinting process

Mori, Toshiharu; Hasegawa, K.; Hatano, Takuji; Kasa, Haruya; Kintaka, Kenji; Nishii, Junji

doi:10.1364/ol.33.000428

Cited by 35 publications

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“…Several fundamental reports have described the direct fabrication of fine structures upon oxide glasses above their deformation temperature. [8][9][10][11][12][13] Furthermore, an antireflective Moth Eye structure was imprinted on an optical glass lens. 14 Such technologies are anticipated for the exploitation of nextgeneration optics for several digital appliances.…”

Section: Introductionmentioning

confidence: 99%

Low-temperature fabrication of fine structures on glass using electrical nanoimprint and chemical etching

Ikutame

Kawaguchi

Ikeda

et al. 2013

Journal of Applied Physics

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Periodic structures were imprinted on a soda lime glass surface below its glass transition temperature (T g ) using a carbon-coated SiO 2 mold under application of DC voltage. The structure height increased with the applied DC voltage, although no significant increase with pressure was found. At a temperature around T g , the height reached saturation. Chemical etching using 55% KOH solution at 70 C increased the structure height to eight times the height before etching. Noticeable alternating depression patterns and rapid chemical etching are closely related with the selective decrease in sodium concentration, which occurred only in the surface areas that were pressurized by the mold. V C 2013 AIP Publishing LLC. [http://dx

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Section: Introductionmentioning

confidence: 99%

Low-temperature fabrication of fine structures on glass using electrical nanoimprint and chemical etching

Ikutame

Kawaguchi

Ikeda

et al. 2013

Journal of Applied Physics

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“…16),17) Higher phase retardation is, however, required for the application of 1D periodic SWS to quarter wavelength plate. Higher phase retardation can be attained by the use of materials with a higher refractive index and/or by the fabrication of higher-aspect-ratio (deeper groove) structure.…”

Section: )-17)mentioning

confidence: 99%

Periodic sub-wavelength structures with large phase retardation fabricated by glass nanoimprint

Mori

Yamashita

Kasa

et al. 2009

J. Ceram. Soc. Japan

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One-dimensional periodic sub-wavelength structures (SWSs) with a period of 300 nm were fabricated on a bismuth germanoborate glass plate by a direct glass nanoimprint method using SiC molds. The borate glass had a refractive index of 1.82 at 587.6 nm wavelength, an internal transmittance higher than 80% at a thickness of 3 mm in the visible wavelength region, and a deformation temperature of 468°C. SWSs with height of a few hundred nanometers were simultaneously fabricated on both surfaces of the glass plate by the glass nanoimprint at 488°C for 120 s with 8 MPa in pressure. The SWSs showed form birefringence. A phase retardation of 0.23 λ was observed between transverse electric (TE)-and transverse magnetic (TM)-polarized beams at 400 nm wavelength.

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“…RIE technology and e-beam lithography were combined where hydrogen silsequioxane (HSQ) was used as a masking layer, and 288-nm-width line pattern was processed in a GC substrate . Moreover, there is another report that also talks about e-beam resist pattern being used as a masking layer in the fabrication of a150-nm-width groove (Mori et al 2008). However, drawing by laser and e-beam is not cost effective because of the long processing time required by these technologies when working with large-size GC substrate.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of glass-like carbon molds to imprint on glass materials by MEMS processing technologies

Mekaru

Okuyama

Ueno³

2012

Microsyst Technol

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We processed a precise relief structure on the surface of a glass-like carbon (GC) substrate by applying micro-electro-mechanical-systems (MEMS) technologies, and made a high temperature resistant mold for thermal imprinting on glass materials. An attractive feature of GC is its chemical stability at high temperatures (above 1,000°C). The down side is its brittleness that makes microfabrication with GC a difficult task. We investigated to find if photolithography combined with reactive-ion-etching (RIE), which are generally used in MEMS fabrication, could be applied for the fabrication of GC molds. In our work with the RIE process, we made masking layers using Au and a positivetone photoresist. By taking advantage of the difference between the etching rates of the masking materials and GC, we fabricated convex mold patterns with vertical and curved sidewalls. From the experimental results imprinted on Pyrex glass and on quartz, the practicability of using both kinds of GC molds appeared to be quite promising. We believe that in the near future these techniques will be successfully applied in the fabrication of large-size GC molds.

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Surface-relief gratings with high spatial frequency fabricated using direct glass imprinting process

Cited by 35 publications

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Low-temperature fabrication of fine structures on glass using electrical nanoimprint and chemical etching

Low-temperature fabrication of fine structures on glass using electrical nanoimprint and chemical etching

Periodic sub-wavelength structures with large phase retardation fabricated by glass nanoimprint

Fabrication of glass-like carbon molds to imprint on glass materials by MEMS processing technologies

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