2005
DOI: 10.1021/la048191x
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Surface Reactions of 1-Propanethiol on GaAs(100)

Abstract: The adsorption and decomposition pathways of 1-propanethiol on a Ga-rich GaAs(100) surface have been investigated using the techniques of temperature programmed desorption, X-ray photoelectron spectroscopy (XPS), and time-of-flight secondary ion mass spectrometry (TOF-SIMS). 1-Propanethiol adsorbs dissociatively on a clean GaAs(100) surface to form propanethiolate and hydrogen. Further reactions of these species to form new products compete with the recombinative desorption of molecular propanethiol. The C-S b… Show more

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Cited by 36 publications
(62 citation statements)
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References 47 publications
(74 reference statements)
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“…Available XPS data for liquid deposition of thiol SAMs on GaAs are controversial, with reports of As-S bonding 10,13 or, by contrast, unresolved Ga-S or As-S bonding. 8,12 It should be noted that observed shifts in As binding energies could be partially caused by the presence of As-H bonds, as we have shown that hydrogen desorption is a very unfavorable process, at least on surfaces prepared in a vacuum.…”
Section: Discussionmentioning
confidence: 88%
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“…Available XPS data for liquid deposition of thiol SAMs on GaAs are controversial, with reports of As-S bonding 10,13 or, by contrast, unresolved Ga-S or As-S bonding. 8,12 It should be noted that observed shifts in As binding energies could be partially caused by the presence of As-H bonds, as we have shown that hydrogen desorption is a very unfavorable process, at least on surfaces prepared in a vacuum.…”
Section: Discussionmentioning
confidence: 88%
“…The absence of this peak in the spectra following thiol deposition is expected since the amount of SH species on the surface in this case is much smaller than after H 2 S decomposition. 8,9 Thus, only direct surface hydrogen recombination is possible after thiol deposition, while after H 2 S adsorption, this process is less efficient and only contributes to the observed broadening of the peak at 480 K.…”
Section: Comparison To Experimental Datamentioning
confidence: 99%
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“…To understand the chemical behavior of alkanethiolate SAMs with long alkyl chains, the reaction mechanisms of small alkanethiols have been investigated on GaAs [19,20]. These small alkanethiols represent suitable analogues.…”
Section: Introductionmentioning
confidence: 99%
“…The low level of oxygen can be attributed to some aerial surface oxidation during sample transfer from the plasma deposition chamber. 35,36 The C(1s) spectra were consistent with hydrocarbon (285.0 eV) and carbon-sulfur (286.9 eV) environments, Supporting Information Figure S The infrared spectrum of allyl mercaptan precursor displays a strong allyl CH 2 stretch absorbance (3080 cm -1 ), 40 which disappears upon plasma deposition, Figure 6. As expected, this feature was absent for both 1-propanethiol monomer and its corresponding plasma polymer.…”
Section: Plasma Deposited Top Layermentioning
confidence: 73%