Surface processing using water cluster ion beams

Takaoka, Gikan H.; Ryuto, Hiromichi; Takeuchi, Mitsuaki; Ichihashi, Gaku

doi:10.1016/j.nimb.2012.11.070

Cited by 3 publications

(2 citation statements)

References 14 publications

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“…The surface of the silicon crystal was oxidized to silicon dioxide with the thickness of ~10 nm . The oxide formation was ascribed to the chemical reactions based on OH radicals generated from the injected water clusters in Si …”

Section: Introductionmentioning

confidence: 99%

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Electrospray droplet impact/secondary ion mass spectrometry (EDI/SIMS) for silver halides

Takaishi

Hiraoka

2014

Surface & Interface Analysis

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Electrospray droplet imact/secondary ion mass spectrometry (EDI/SIMS) was applied to many materials such as synthetic polymers, metals, semiconductors, and biological tissues. Little surface modification was observed for these samples by in situ XPS analysis. In this work, silver halides AgX (X = F, Cl, Br, and I) were examined by EDI/SIMS. The preferential etching of F for AgF was observed for the first time. This is due to the highly reactive F atoms generated at the colliding interface that are quickly annihilated by the reaction with water molecules. The selective etching of fluorine results in the enrichment of silver on the sample surface leading to the abundant Ag + ion formation. It was suggested that metal fluorides may be useful as the cationization matrices in EDI/SIMS.

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Section: Introductionmentioning

confidence: 99%

“…The penetration of water droplets into the sample must be negligible in EDI. The increase in size of the clusters from (H 2 O) 2500 to (H 2 O) 90 000 brings about characteristic difference in the collisional events for water cluster ion bombardment (i.e. cluster size effect).…”

Section: Introductionmentioning

confidence: 99%

Electrospray droplet impact/secondary ion mass spectrometry (EDI/SIMS) for silver halides

Takaishi

Hiraoka

2014

Surface & Interface Analysis

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Irradiation effect of gas-hydrate cluster ions on solid surfaces

Takaoka

Ryuto

Takeuchi

et al. 2014

Nuclear Instruments and Methods in Physics Research Section B:

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In our newly developed gas-hydrate cluster ion source, a vapor of water bubbling with carbon dioxide (CO2) gas was ejected through a nozzle into a vacuum region, and mixed beams of water clusters and carbon dioxide-hydrate clusters were produced by adiabatic expansion. According to time-of-flight measurements, the largest water clusters consisted of approximately 2800 molecules at a vapor pressure of 0.3 MPa. Also, the largest mixed clusters contained approximately 2000 molecules. Copper and silicon substrates were irradiated by the water cluster ions as well as carbon dioxide-hydrate cluster ions. X-ray photoelectron spectroscopy measurements showed that carbon was included in the Cu and Si substrates irradiated by the carbon dioxide-hydrate cluster ions, and a chemical shift owing to the formation of carboxyl radicals occurred on the Cu surface. Furthermore, the Cu surface was sputtered, and the sputtering depth was larger than the distance penetrated by the water cluster ion irradiation. Therefore, the formation of carboxyl radicals played an important role in the sputtering of the Cu surface, which occurred effectively in carbon dioxide-hydrate cluster ion irradiation.

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Development of Water Cluster Ion Beam Source and Its Application

Hiraoka

2016

J. Vac. Soc. Jpn.

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Water cluster ion beam source was developed. Multiply-charged water clusters were generated by ambient or vacuum electrospray. Cluster ions (represented as [(H 2 O) 90,000 ＋100H)] 100＋) impact the solid sample under vacuum with kinetic energy of 10 6 eV. Supersonic collisions of water droplets with the surface lead to the atomic/molecular level sample desorption, high-e‹ciency ionization, and non-selective surface etching without sample modiˆcation. By this technique, inorganic materials and organic materials can be etched with etching rates of a few and 10 nm/min, respectively. This technique was successfully applied to the interface analysis for CuO/ Cu.

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Surface processing using water cluster ion beams

Cited by 3 publications

References 14 publications

Electrospray droplet impact/secondary ion mass spectrometry (EDI/SIMS) for silver halides

Electrospray droplet impact/secondary ion mass spectrometry (EDI/SIMS) for silver halides

Irradiation effect of gas-hydrate cluster ions on solid surfaces

Development of Water Cluster Ion Beam Source and Its Application

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