2015
DOI: 10.1109/led.2015.2450835
|View full text |Cite
|
Sign up to set email alerts
|

Surface Processing of CdTe Detectors Using Hydrogen Bromide-Based Etching Solution

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0
1

Year Published

2017
2017
2024
2024

Publication Types

Select...
5
1

Relationship

0
6

Authors

Journals

citations
Cited by 6 publications
(2 citation statements)
references
References 12 publications
0
1
0
1
Order By: Relevance
“…This serves to produce a Te-rich layer at the back surface and in many cases to also remove residues from the Cl activation process. [11,[22][23][24][25][26][27][28][29][30][31] Shallow etching of CdTe, specifically processes that selectively remove Cd, are typically used. Additionally, etching can help in forming better Ohmic contacts and thus has been widely used.…”
Section: Introductionmentioning
confidence: 99%
“…This serves to produce a Te-rich layer at the back surface and in many cases to also remove residues from the Cl activation process. [11,[22][23][24][25][26][27][28][29][30][31] Shallow etching of CdTe, specifically processes that selectively remove Cd, are typically used. Additionally, etching can help in forming better Ohmic contacts and thus has been widely used.…”
Section: Introductionmentioning
confidence: 99%
“…Здесь необходимо отметить, что в настоящее время бинарные компоненты системы ZnSe-CdTe находят ши-рокое применение в опто-и микроэлектронике, в частности, при разработке лазеров [3] солнечных элементов [4], детекторов рентгеновского [5] и γ-излучения [6]. Уникальные физико-химические поверхностные свойства CdTe и ZnSe обусловливают перспективы их применения в газовом анализе [1].…”
unclassified