Abstract:Techniques for large‐area pattern formation on polymeric substrates are important for fabricating a large variety of functional devices, such as flexible electronics, tunable optical devices, adhesives, and so on. The present study demonstrates a method for pattern formation on poly(dimethylsiloxane) that involves grafting methacrylate polymers through photo‐initiated polymerization. The influence of substrate stiffness and monomers type on pattern formation was investigated. Firstly, the stiffness of the subs… Show more
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