2003
DOI: 10.1016/s0040-6090(03)01094-0
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Surface OH groups governing surface chemical properties of SiO2 thin films deposited by RF magnetron sputtering

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Cited by 33 publications
(33 citation statements)
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“…The observed increasing trend is consistent with previous study [33]. The behavior of this system is associated with amount of surface OH species determined by X-ray photoelectron spectroscopy (XPS) reported by our group [23] and others (see for example [34]). …”
Section: Resultssupporting
confidence: 92%
“…The observed increasing trend is consistent with previous study [33]. The behavior of this system is associated with amount of surface OH species determined by X-ray photoelectron spectroscopy (XPS) reported by our group [23] and others (see for example [34]). …”
Section: Resultssupporting
confidence: 92%
“…However, similarly high contact angles on silicon oxide surfaces were also reported in literature [16]. The variation in the wettability is commonly explained by difference in the preparation method and the altering of the surfaces properties by absorption of organic materials [16,17]. In this context, it is interesting to note that significantly smaller contact angles were measured on the silicon oxide covered pyramid structures than for smooth and crater-like structured samples with identical surface chemistry.…”
Section: Influence Of Structure On Wettabilitysupporting
confidence: 73%
“…When we used X-ray photoelectron spectroscopy (XPS) to analyze the chemical species on the surfaces of the as-polished Ti, as-anodized Ti, and hydrothermally treated Ti samples processed at 453 K, the elements C, O, and Ti were detected on all the samples. In general, WCA is strongly related to the surface chemical species, such as OH groups and adsorbed hydrocarbon, each of which has the opposite effect on WCA [23,25]. The numbers of OH groups and amounts of adsorbed hydrocarbon on the as-polished Ti, the as-anodized Ti, and the hydrothermally treated Ti are shown in Figure 4.…”
Section: Effect Of Hydrothermal Treatment On Filmmentioning
confidence: 99%