Micro and Nanoscale Laser Processing of Hard Brittle Materials 2020
DOI: 10.1016/b978-0-12-816709-0.00013-6
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Surface nanostructuring of hard brittle materials

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Cited by 4 publications
(5 citation statements)
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“…In addition, FIB is time‐consuming, especially when one tries to minimize ion‐beam damage by slowing down the milling rate. [ 146 ] Therefore, much work is needed for the FIB method to be practical for the mass production of MHP lasers.…”
Section: Optical Cavity For Metal‐halide Perovskite (Mhp) Lasersmentioning
confidence: 99%
“…In addition, FIB is time‐consuming, especially when one tries to minimize ion‐beam damage by slowing down the milling rate. [ 146 ] Therefore, much work is needed for the FIB method to be practical for the mass production of MHP lasers.…”
Section: Optical Cavity For Metal‐halide Perovskite (Mhp) Lasersmentioning
confidence: 99%
“…Since the size of the laser spot is larger than the heat propagation depth during the nanosecond green laser action time, the plate can be regarded as a semi-infinite object according to the onedimensional heat conduction problem approximately. As mentioned in the introduction, for heat conduction, the following equation can be used [40,41]:…”
Section: Principles Of Laser Cleaning Assisted By Airflowmentioning
confidence: 99%
“…A comparison of these nanofabrication techniques is shown in Table 1. [11], and 58 nm/min [12] against different resists Slow 0.05 µm 3 /s in FIB deposition [13] Fast 15 wafers/h per imprint station [14] See Table 2 The biggest advantage of EBL and FIB is that they can pattern nanostructures with feature size in sub-5 nm and can process a wide range of materials, such as metals [8], alloys [15], hard and brittle ceramics and semiconductors [13], and polymers [16], making them extremely suitable techniques to process nanostructures with high precision [17]. However, the processing environment is harsh and requires vacuum operation.…”
Section: Introductionmentioning
confidence: 99%
“…FIB is similar to EBL in the limitation of processing speeds. For example, the FIB deposition rate can reach a maximum of up to 0.05 µm 3 /s [13]. The processing speed of EBL is dependent on the type of electron beam resist.…”
Section: Introductionmentioning
confidence: 99%