2014
DOI: 10.1016/j.apsusc.2014.03.022
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Surface modification of titanium using He plasma

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Cited by 42 publications
(46 citation statements)
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“…On the other hand, when the surface temperature was lower than 1000 K, the fuzz structure was not formed, and a rough structure appeared on the surface. The lower limit surface temperature conditions for nanostructure formation were within about 0.3 to 0.4 of the melting point of WC that is 3143 K. Surface temperature dependence was consistent with other materials [1,2,4]. The formation conditions and the shape of the fuzz structure were similar to those of W formed at temperatures higher than about 1000 K [1].…”
Section: Methodssupporting
confidence: 78%
See 1 more Smart Citation
“…On the other hand, when the surface temperature was lower than 1000 K, the fuzz structure was not formed, and a rough structure appeared on the surface. The lower limit surface temperature conditions for nanostructure formation were within about 0.3 to 0.4 of the melting point of WC that is 3143 K. Surface temperature dependence was consistent with other materials [1,2,4]. The formation conditions and the shape of the fuzz structure were similar to those of W formed at temperatures higher than about 1000 K [1].…”
Section: Methodssupporting
confidence: 78%
“…The nanostructures are called "fuzz". The fuzz structures are formed on various metals such as molybdenum, titanium, iron, and vanadium; the needle-like nanostructures are also formed on silicon by the irradiation [1][2][3][4]. In addition, effects on the optical absorption have been reported due to the formation of nanostructures [5,6].…”
Section: Introductionmentioning
confidence: 99%
“…Similar closed pores microstructures can be found in ion-irradiated or ion-implanted thin films [17][18][19][20][21][22][23] which have been pointed out as fabrication routes for nanostructured materials and surfaces. [19][20][21][22][23][24][25] Generally these microstructures consist in few pores situated at a certain distance from the surface; while with our methodology, highly porous structures with uniform porosity from the substrate to the coatings surface are deposited, in a wide range of thicknesses (from 100 nm to few microns).…”
mentioning
confidence: 61%
“…[19][20][21][22][23][24][25] Generally these microstructures consist in few pores situated at a certain distance from the surface; while with our methodology, highly porous structures with uniform porosity from the substrate to the coatings surface are deposited, in a wide range of thicknesses (from 100 nm to few microns). From a fundamental point of view these new materials with embedded pores, filled with the sputtering gas, represent a new class of nanocomposite materials presenting on demand optical properties in comparison with the matrix film.…”
mentioning
confidence: 99%
“…Figure 2 presents a He fluence dependence of the morphology change. [44,45] On Ti case, only nano-cones without FNs were formed on the surface by He plasma irradiation presumably due to sputtering. The irradiation times of Figure 2(a-c) were 1, 3, and 10 h, respectively.…”
Section: Morphology Changesmentioning
confidence: 98%