Surface modification of recycled polymers in comparison to virgin polymers using Ar/O<sub>2</sub> plasma etching

Amberg, Michel; Höhener, Marion; Rupper, Patrick; Hanselmann, Barbara; Hufenus, Rudolf; Lehner, Sandro; Perret, Edith; Hegemann, Dirk

doi:10.1002/ppap.202200068

Cited by 8 publications

(6 citation statements)

References 49 publications

(70 reference statements)

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“…As shown in Figure 7a, the etching rate increases from 200 nm/min to 600 nm/min when the ion energy is increased from 30 eV to 200 eV [130] . Similar trends are observed with PET films exposed to Ar-O2 plasma, where higher ion energies not only improve etching, but result also in a heater load of the substrate [75] .…”

Section: Etching Ratesupporting

confidence: 78%

“…The sheath oscillates with the RF cycle, expanding and contracting, which modulates the energy of the ions impacting the electrode and consequently affecting etching or deposition rates. Given the selection of suitable process gases and conditions, RF-CCP exhibits versatility in applications, ranging from surface modification to thin film growth [75,76] .…”

Section: Radio Frequency (Rf) Plasma Devicesmentioning

confidence: 99%

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From Basics to Frontiers: A Comprehensive Review of Plasma-Modified and Plasma-Synthesized Polymer Films

Dufour

2023

Polymers

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This comprehensive review begins by tracing the historical development and progress of cold plasma technology as an innovative approach to polymer engineering. The study emphasizes the versatility of cold plasma derived from a variety of sources including low-pressure glow discharges (e.g., radiofrequency capacitively coupled plasmas) and atmospheric pressure plasmas (e.g., dielectric barrier devices, piezoelectric plasmas). It critically examines key operational parameters such as reduced electric field, pressure, discharge type, gas type and flow rate, substrate temperature, gap, and how these variables affect the properties of the synthesized or modified polymers. This review also discusses the application of cold plasma in polymer surface modification, underscoring how changes in surface properties (e.g., wettability, adhesion, biocompatibility) can be achieved by controlling various surface processes (etching, roughening, crosslinking, functionalization, crystallinity). A detailed examination of Plasma-Enhanced Chemical Vapor Deposition (PECVD) reveals its efficacy in producing thin polymeric films from an array of precursors. Yasuda’s models, Rapid Step-Growth Polymerization (RSGP) and Competitive Ablation Polymerization (CAP), are explained as fundamental mechanisms underpinning plasma-assisted deposition and polymerization processes. Then, the wide array of applications of cold plasma technology is explored, from the biomedical field, where it is used in creating smart drug delivery systems and biodegradable polymer implants, to its role in enhancing the performance of membrane-based filtration systems crucial for water purification, gas separation, and energy production. It investigates the potential for improving the properties of bioplastics and the exciting prospects for developing self-healing materials using this technology.

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Section: Etching Ratesupporting

confidence: 78%

Section: Radio Frequency (Rf) Plasma Devicesmentioning

confidence: 99%

From Basics to Frontiers: A Comprehensive Review of Plasma-Modified and Plasma-Synthesized Polymer Films

Dufour

2023

Polymers

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“…However, the plasma activation and plasma thin film deposition on such complex polymeric substrates has been rarely addressed. [ 93,94 ] Future research should consider the interaction between such complex polymer surfaces with activating and polymerizing plasmas, as well as the migration processes of contaminants in the system consisting of plastic, the PECVD layer and a foodstuff. It is likely that, especially for such substrates, the combined plasma and surface analytical approach is imperative.…”

Section: Outlook/perspectivesmentioning

confidence: 99%

PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth

de los Arcos,

Awakowicz,

Benedikt

et al. 2023

Plasma Processes & Polymers

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This feature article presents recent results on the analysis of plasma/polymer interactions and the nucleation of ultra‐thin plasma films on polymeric substrates. Because of their high importance for the understanding of such processes, in situ analytical approaches of the plasma volume as well as the plasma/substrate interfaces are introduced before the findings on plasma surface chemistry. The plasma activation of polymeric substrates is divided into the understanding of fundamental processes on model substrates and the relevance of polymer surface complexity. Concerning thin film nucleation and growth, both plasma‐enhanced chemical vapor deposition and plasma‐enhanced atomic layer deposition processes as well as the combination of both processes are considered both for model substrates and technical polymers. Based on the comprehensive presentation of recent results, selective perspectives of this research field are discussed.

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“…Atmospheric pressure plasma jet (APPJ), especially for microwave plasma jet, has a low working temperature, contains rich active particles, small ozone, and NO 2 emission and attracts great interest in wound healing, sterilization and disinfection, surface modification, and sewage purification. [1][2][3][4][5][6][7][8][9][10][11][12] Monoatomic gases, He and Ar, are often selected as the discharge working gas to generate APPJ, because the ionization efficiency of polyatomic gas is low. Many studies have been conducted on the discharge characteristics of APPJ produced by He and Ar.…”

Section: Introductionmentioning

confidence: 99%

Discharge characteristics of atmospheric pressure pulsed microwave He/N₂ plasma jet

Yang

Chen

Dai

et al. 2023

Plasma Processes & Polymers

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It is difficult to generate jet-shaped He microwave plasma jets in ambient air. In this study, a dual-channel pulsed microwave coaxial resonant discharge device is constructed. An atmospheric pressure pulsed microwave He plasma jet is formed when He passes through the central copper tube. And a spatially layered He/N 2 plasma jet is produced when He and N 2 are aerated through the central copper tube and the resonant cavity, respectively. The spatiotemporal ionization evolution

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Surface modification of recycled polymers in comparison to virgin polymers using Ar/O₂ plasma etching

Cited by 8 publications

References 49 publications

From Basics to Frontiers: A Comprehensive Review of Plasma-Modified and Plasma-Synthesized Polymer Films

From Basics to Frontiers: A Comprehensive Review of Plasma-Modified and Plasma-Synthesized Polymer Films

PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth

Discharge characteristics of atmospheric pressure pulsed microwave He/N₂ plasma jet

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Surface modification of recycled polymers in comparison to virgin polymers using Ar/O2 plasma etching

Cited by 8 publications

References 49 publications

From Basics to Frontiers: A Comprehensive Review of Plasma-Modified and Plasma-Synthesized Polymer Films

From Basics to Frontiers: A Comprehensive Review of Plasma-Modified and Plasma-Synthesized Polymer Films

PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth

Discharge characteristics of atmospheric pressure pulsed microwave He/N2 plasma jet

Contact Info

Product

Resources

About

Surface modification of recycled polymers in comparison to virgin polymers using Ar/O₂ plasma etching

Discharge characteristics of atmospheric pressure pulsed microwave He/N₂ plasma jet