Surface modification of feldspar porcelain by corona discharge and its effect on bonding to resin cement with silane coupling agent

Komagata, Yuya; Ikeda, Hiroshi; Fujio, Yusaku; Nagamatsu, Yuki; Shimizu, Hiroshi

doi:10.1016/j.jmbbm.2020.103708

Cited by 13 publications

(1 citation statement)

References 54 publications

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“…Extensive studies and experimentation have been conducted to refine surface treatment methods for glass-ceramic-based materials. Various techniques, including plasma irradiation 13,14) , airborne-particle abrasion 15,16) , laser abrasion 17,18) , and chemical etching 19,20) , have been explored for modifying the material surface to improve bonding with the luting agent. Among these methods, chemical etching with hydrofluoric acid (HF) shows high efficiency in etching material surfaces 12) .…”

Section: Introductionmentioning

confidence: 99%

Chemical etching of CAD-CAM glass-ceramic-based materials using fluoride solutions for bonding pretreatment

NISHIZAWA,

KOMAGATA,

NAGAMATSU

et al. 2024

Dent. Mater. J.

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The surface treatment of glass-ceramic-based materials, namely, lithium disilicate glass (IPS e.max CAD), feldspar porcelain (VITABLOCS Mark II), and a polymer-infiltrated ceramic network (VITA ENAMIC), using aqueous fluoride solutions and their influence on luting agent bonding were investigated. Six experimental aqueous fluoride solutions were applied to these materials, and their effects were assessed by surface topological analysis. The obtained results were compared using non-parametric statistical analyses. Ammonium hydrogen fluoride (AHF) etchant demonstrated the greatest etching effect. Subsequent experiments focused on evaluating different concentrations of the AHF etchant for the bonding pretreatment of glass-ceramic-based materials with a luting agent (PANAVIA V5). AHF, particularly at concentrations above 5 wt%, effectively roughened the surfaces of the materials and improved the bonding performance. Notably, AHF at a concentration of 30 wt% exhibited a more pronounced effect on both etching and bonding capabilities compared to hydrofluoric acid.

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