2002
DOI: 10.1006/jcis.2002.8565
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Surface Functionalization of Silicon Oxide at Room Temperature and Atmospheric Pressure

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Cited by 59 publications
(58 citation statements)
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“…In our approach, the OH-modified TCO substrate was dipped into a solution containing 3-mercaptopropyl(trimethoxysilane) (MPTMS, 0.56 M) in ethanol at 295 K to create a thiol-functionalized silane SAM film on TCO. After this treatment, the contact angle of water on the TCO surface increased to 70.01, which is consistent with that reported in the literature (691), 25 thereby confirming the formation of a dense MPTMS monolayer on TCO.…”
Section: Resultssupporting
confidence: 91%
“…In our approach, the OH-modified TCO substrate was dipped into a solution containing 3-mercaptopropyl(trimethoxysilane) (MPTMS, 0.56 M) in ethanol at 295 K to create a thiol-functionalized silane SAM film on TCO. After this treatment, the contact angle of water on the TCO surface increased to 70.01, which is consistent with that reported in the literature (691), 25 thereby confirming the formation of a dense MPTMS monolayer on TCO.…”
Section: Resultssupporting
confidence: 91%
“…Therefore, the silanization reaction may restrict the overall process design for labon-a-chip systems. Gas phase reactions do not interfere in this manner, but often appear inadequate in terms of gasor time-consumption [10,11]. Therefore, in order to find reaction conditions that address these issues and that allow flexible integration into a microfabrication process as the key technology for miniaturized biosensors and electronic devices, we developed an advanced gas phase reaction (GP) method.…”
Section: Introductionmentioning
confidence: 99%
“…More than a decade ago, Pavlovic et al published a straightforward method for modifying silicon surfaces at atmospheric pressure and room temperature [11]. The authors used a simple plastic centrifugation tube to direct an argon flow across a mercaptosilane (MPTMS) drop and then past a substrate surface.…”
Section: Introductionmentioning
confidence: 99%
“…We use a gas-phase method based on Ref. 13 to modify the surface of the probe with 3-aminopropyltrimethoxysilane ͑APTMS; Tokyo Kasei Kogyo͒ molecules. Gas-phase preparations have been proven to produce better quality surfaces than liquid preparation.…”
mentioning
confidence: 99%
“…Gas-phase preparations have been proven to produce better quality surfaces than liquid preparation. 13,14 In short, a nitrogen flow of approximately 1 L/min was used to increase the evaporation rate of the silane molecules by lowering the partial pressure of the silane molecules in the gas phase above the liquid silane, at room temperature and atmospheric pressure. Thus, an increased number of molecules came into contact with the silicon oxide surface of the probe placed in the reactor.…”
mentioning
confidence: 99%