Surface etching evolution of mechanically polished single crystal diamond with subsurface cleavage in microwave hydrogen plasma: Topography, state and electrical properties

Zheng, Yuting; Jia, Yanwei; Liu, Jinlong; Wei, Junjun; Chen, Liangxian; An, Kang; Yan, Xiongbo; Zhang, Xiaolin; Ye, Haitao; Ouyang, Xiaoping; Li, Chengming

doi:10.1016/j.vacuum.2022.110932

Cited by 13 publications

(8 citation statements)

References 68 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Plasma treatment is a process that modifies any surface in a controlled, reproducible, and homogeneous manner. Mostly, it is used for surface cleaning, etching, functional group modification, or cross-linking of organic molecules/polymer chains. − The plasma creates a number of reactive species, notably photons, electrons, ions, radicals, and so forth, and this process initiates secondary reactions as well . Here, Ar–O 2 plasma treatment is used for surface modification of CsPbBr 3 NCs films, as shown schematically in Figure a.…”

Section: Resultsmentioning

confidence: 99%

Plasma-Treated CsPbBr₃ Nanocrystal Films for Anticounterfeiting Applications

Rathod

Das

et al. 2022

ACS Appl. Nano Mater.

View full text Add to dashboard Cite

Lead halide perovskite (LHP) nanocrystals (NCs) are considered propitious materials due to their extraordinary optoelectronic properties. Their poor ambient stability hinders their practical applications. Among the several approaches taken to enhance the ambient stability, plasma treatment is considered one of the best approaches because it does not hinder charge transport or reduce relative NC content while allowing easy and scalable processing. The plasma treatment increases the overall ambient stability of LHPs but at the cost of photoluminescence quantum yield (PLQY). We found that a short duration of the plasma treatment enhances the PL intensity by 30%, along with enhanced moisture stability. However, longer duration of plasma treatment decreases the photoluminescence (PL), and the NCs become hydrophilic. In this work, we report the underlying chemistry of stability enhancement during plasma treatment and how it affects the PL intensity. We performed Ar−O 2 plasma treatment on the CsPbBr 3 NCs thin films, which induces the cross-linking of the passivating ligand oleylamine that creates a stronger network of ligands, providing better encapsulation and higher PL intensity. A longer duration of plasma treatment results in oxidation of the passivating ligands in the presence of oxygen that eventually degrades the NCs. We created double-layer fluorescent security tags using the PL-stabilized NCs and as-synthesized NCs, having the same emission profile. The security pattern was created using the stabilized perovskite and masked with the assynthesized perovskite, which is relatively unstable and can be washed off under certain treatments.

show abstract

Section: Resultsmentioning

confidence: 99%

Plasma-Treated CsPbBr₃ Nanocrystal Films for Anticounterfeiting Applications

Rathod

Das

et al. 2022

ACS Appl. Nano Mater.

View full text Add to dashboard Cite

show abstract

“…Even for the same crystal plane, there are harder or softer polishing directions. For example, the <100> direction, along which a higher removal rate and better surface quality can be obtained, is considered to be a soft direction on the (001) plane, Energy beam polishing techniques of diamond [8,39,46,48,[50][51][52][53]. Reproduced from [8] with permission from the Royal Society of Chemistry.…”

Section: Scdmentioning

confidence: 99%

“…Reprinted from [48], Copyright (2013), with permission from Elsevier. Reprinted from [50], Copyright (2022), with permission from Elsevier. Reprinted from [51], Copyright (2021), with permission from Elsevier.…”

Section: Scdmentioning

confidence: 99%

“…Hicks et al [115] achieved near-zero density of surface pits using the Ar/O 2 /CF 4 reactive plasma etching, and the addition of argon made a significant contribution, reducing the surface roughness by 20%-44%. Zheng et al [50] used microwave hydrogen plasma to treat the surface of SCD and obtained a high-quality surface with an RMS surface roughness of 4.2 nm. The MRR of this technology is 169 nm h −1 .…”

Section: Ibpmentioning

confidence: 99%

See 1 more Smart Citation

Energy beam-based direct and assisted polishing techniques for diamond: A review

Li,

Jiang,

Jiang

et al. 2023

Int. J. Extrem. Manuf.

View full text Add to dashboard Cite

Diamond is a highly valuable material with diverse industrial applications, particularly in the fields of semiconductor, optics, and high-power electronics. However, its high hardness and chemical stability make it difficult to realize high-efficiency and ultra-low damage machining of diamond. To address these challenges, several polishing methods have been developed for both single crystal diamond (SCD) and polycrystalline diamond (PCD), including mechanical, chemical, laser, and ion beam processing methods. In this review, the characteristics and application scope of various polishing technologies for SCD and PCD are highlighted. Specifically, various energy beam-based direct and assisted polishing technologies, such as laser polishing, ion beam polishing, plasma-assisted polishing, and laser-assisted polishing, are summarized. The current research progress, material removal mechanism, and influencing factors of each polishing technology are analyzed. Although some of these methods can achieve high material removal rates or reduce surface roughness, no single method can meet all the requirements. Finally, the future development prospects and application directions of different polishing technologies are presented.

show abstract

“…The spectrum was fitted into component peaks by the Voigt function and Shirley method for background deduction using OriginPro software. The fitted peaks are according to sp 2 (C=C) amorphous carbon, sp 3 (C-C) nanodiamond, C-O/C-O-C, and C=O atmospheric oxygen-containing groups at binding energies of 284.3 eV, 28) 284.9 eV, 29) 286.7 eV 30) and 288 eV, 31) respectively. To exclude the impact of these adsorbed oxygen functional groups on the accuracy of previous hardness assessment, the film was mechanically polished like a mirror prior to prompt hardness evaluation.…”

mentioning

confidence: 99%

Adhesion of nanodiamond composite films on Ti substrates at room temperature via hybrid ion etching gun and coaxial arc plasma deposition

Mohamed

Ali

Zkria

et al. 2022

Appl. Phys. Express

View full text Add to dashboard Cite

It has been extremely difficult for nanodiamond composite (NDC) films to be deposited on Ti due to a large thermal expansion coefficient difference. Native oxide layer on Ti is another problem preventing the appropriate adhesion of NDC films and subsequent delamination. In this work, innovative room temperature adhesion of 3μm NDC films with 54GPa hardness on Ti substrates was accomplished via a hybrid system of ion etching gun and coaxial arc plasma deposition (CAPD). Ar+ plasma etching is capable to terminate the superficial TiO2 layer and manipulate substrate morphology while, CAPD provides instantaneous deposition of NDC films at room temperature

show abstract

Surface etching evolution of mechanically polished single crystal diamond with subsurface cleavage in microwave hydrogen plasma: Topography, state and electrical properties

Cited by 13 publications

References 68 publications

Plasma-Treated CsPbBr₃ Nanocrystal Films for Anticounterfeiting Applications

Plasma-Treated CsPbBr₃ Nanocrystal Films for Anticounterfeiting Applications

Energy beam-based direct and assisted polishing techniques for diamond: A review

Adhesion of nanodiamond composite films on Ti substrates at room temperature via hybrid ion etching gun and coaxial arc plasma deposition

Contact Info

Product

Resources

About

Surface etching evolution of mechanically polished single crystal diamond with subsurface cleavage in microwave hydrogen plasma: Topography, state and electrical properties

Cited by 13 publications

References 68 publications

Plasma-Treated CsPbBr3 Nanocrystal Films for Anticounterfeiting Applications

Plasma-Treated CsPbBr3 Nanocrystal Films for Anticounterfeiting Applications

Energy beam-based direct and assisted polishing techniques for diamond: A review

Adhesion of nanodiamond composite films on Ti substrates at room temperature via hybrid ion etching gun and coaxial arc plasma deposition

Contact Info

Product

Resources

About

Plasma-Treated CsPbBr₃ Nanocrystal Films for Anticounterfeiting Applications

Plasma-Treated CsPbBr₃ Nanocrystal Films for Anticounterfeiting Applications