1967
DOI: 10.1049/el:19670363
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Surface enhancement of CdSe by SiO2

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1972
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Cited by 5 publications
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“…It was reported [20,21] that the thermal evaporation of a SiO x layer onto a CdSe film may produce an accumulation layer at the SiO x -CdSe interface, thus causing a Fermi-level shift upwards in the interface region of the CdSe film. It was also found [21] that, in the accumulation layer, the room temperature conductivity is more than a hundred times higher than that in the bulk of the film.…”
Section: Charge Transport In Sio X -Cdse Composite Filmsmentioning
confidence: 99%
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“…It was reported [20,21] that the thermal evaporation of a SiO x layer onto a CdSe film may produce an accumulation layer at the SiO x -CdSe interface, thus causing a Fermi-level shift upwards in the interface region of the CdSe film. It was also found [21] that, in the accumulation layer, the room temperature conductivity is more than a hundred times higher than that in the bulk of the film.…”
Section: Charge Transport In Sio X -Cdse Composite Filmsmentioning
confidence: 99%
“…Now, we return to the above-mentioned peculiarity that dark conductivity measured in SiO x /CdSe MLs is considerably lower than that of the respective composite films having CdSe NCs of the same average size (compare table 1 and table 2). It has been observed [20] that the thinner the SiO x layer deposited on the CdSe film, the weaker the accumulation effect in the CdSe interface region. Bearing this result in mind, we assume that the very thin (2.5-10 nm) SiO x sublayers of SiO x /CdSe MLs have no accumulation effect on the CdSe sublayers, while the much thicker (20-100 nm) SiO x 'sublayers' in the SiO x -CdSe composite films strongly affect the CdSe NC conductivity.…”
Section: Charge Transport In Sio X -Cdse Composite Filmsmentioning
confidence: 99%