Surface cleaning of metals in air with a one atmosphere uniform glow discharge plasma

A Review of Simulation Modeling of the State Evaluation and Process Prediction of Plasma Processing under Atmospheric Pressure

“…DC discharges are typically operated in two modes [8], namely, pulsed mode, which involves short-duration situations with intermittent energy input, and 2) continuous mode, which enables stable, long-time, and significant energy input. For AC discharges, characterized by alternating fields in energy sources, three primary categories exist, namely, those m −3 ) Applications Spraying [3,[26][27][28][29][30], etching [2,31,32], waste treatment [33,34], welding [35,36], surface modification [37,38] Surface modification [1,39], surface treatment [4,5,40,41], synthesis [5,42], nanomanufacturing [43][44][45][46], film deposition [47][48][49], pollution control [42,50] utilizing alternating electric (E) fields, those using alternating magnetic (H) fields, and those employing microwave electromagnetic fields. These discharges operate across a frequency range, starting from low frequency (LF) within the kHz range, progressing to RF in the MHz range, and ultimately reaching microwave frequencies in the GHz range.…”

“…These characteristics contribute to its capability to operate at reasonably high power levels, thereby expanding its applications. Currently, DBD plasma finds widespread use across various material processing domains, including glass films [61], metal surface cleaning [4,5], plasma-assisted polymer chemical vapor Fig. 7 AC discharge plasma generation structures: (a) DBD plasma [50], (b) CCP [19,73,74], (c) typical ICP [75], (d) typical MIP [76], (e) typical microplasma RFIC [77], and typical microplasma RFCC [77] deposition [81], and ozone synthesis [5,42].…”

“…Corona [49,56,61,100] Non-LTE plasma n e = 10 15 -10 19 m −3 , T e = 40,000-60,000 K, T h < 400 K, V b = 1-20 kV DBD [4,5,20,42,50,78,79] Non-LTE plasma n e = 10 18 -10 21 m −3 , T e = 10,000-100,000 K, T h < 700 K, V b = 4-25 kV AC discharges CCP [10,19,20,53,73,[84][85][86]89] Non-LTE plasma n e ~ 10 17 m −3 , T e = 7,000-14,000 K, T h close to room temperature, P = 5-700 W ICP [10,15,20,29,31,32,34,53,75,90,91] LTE plasma n e = 10 21 -10 26 m −3 , T e ≈ T h = 6,000-11,000 K, P = 0.25─700 kW MIP [8, 43-45, 47, 48, 76, 92, 101] Non-LTE plasma n e ≈ 10 16 -10 18 m −3 , T e = 5,000-12,000 K, T h ≈ 300-1,500 K, P = 0.05-several kW Microplasmas [70,77,94,96] Close to the properties of ICP or CCP achievements and challenges of current simulation models in atmospheric plasma generation, this section will specifically focus on thermal and nonthermal plasma generation modeling methods, particularly in terms of applied assumptions, boundary conditions, and practical processing problems that can be addressed.…”

“…Their characteristics are heavily influenced by atmospheric conditions and activation methods, rendering them versatile for various processing applications. Currently, atmospheric pressure plasmas have become increasingly interesting and are widely used in different fields [1][2][3][4][5] because they avoid expensive vacuum chamber usage and can be conveniently processed. Depending on the approach for plasma generation, atmospheric plasmas have many categories, each governed by complex multiphysics interactions and generation principles.…”