Abstract:In order to improve the channel elecron mobility and decrease the surface roughness of SiC ,we have cleaned the SiC surfacre by hydrogen plasma with ECR–PEMOCVD plasma system. The surfaces were investigated by RHEED and X-ray Photoelectron Spectroscopy before and after hydrogen plasma cleanging. It indicated that the Si oxide content of SiC surface cleaned by hydrogen plasma for 18minutes is significantly higher than for 12 minutes and the SiC surface cleaned for 12 minutes at 200°C with ECR–PEMOCVD plasma sys… Show more
Set email alert for when this publication receives citations?
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.