Surface chemistry and trimethylsilyl functionalization of Stöber silica sols

Suratwala, Tayyab; Hanna, M.Leslie; Miller, Eric L.; Whitman, Pamela K.; Thomas, Ian M.; Ehrmann, Paul R.; Maxwell, Robert S.; Burnham, Alan K.

doi:10.1016/s0022-3093(02)01629-0

Cited by 119 publications

(84 citation statements)

References 28 publications

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“…12 The molar ratio of EtOH/NH 3 /H 2 O/TEOS was 9 : 0.2 : 2.5 : 1. TEOS and fractional absolute alcohol was first charged in threenecked round bottom flask, then the residual absolute alcohol, deionized water and ammonia were dropped within 0.5 h. The mixture was kept at 50°C and stirred overnight.…”

Section: Preparation and Modification Of Colloidal Silica Particlesmentioning

confidence: 99%

“…The reported research work mainly concentrates on the synthesis and characterization of the resultant UV-curable nanocomposites films. [12][13][14][15] However, the kinetics study is also very important to understand the final property and microstructure of UV-curable nanocomposites because the advantages of UV-curing are shown on its curing process rather than on the resultant materials properties.…”

Section: Introductionmentioning

confidence: 99%

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Kinetic investigations on the UV‐induced photopolymerization of nanocomposites by FTIR spectroscopy

Zhou

You

et al. 2005

J of Applied Polymer Sci

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ABSTRACT:The kinetics of the photopolymerization for nanocomposites containing nanosilica with 2,2-dimethoxy-1,2-diphenylethan-1-one or benzophenone/n-methyl diethanolamine (BP/MDEA)as photoinitiators were studied by FTIR spectroscopy. It was found that nanocomposites containing nanosilica had higher conversion in comparison with pristine EA. The presence of MPS and ethanol accelerated the photopolymerization of nanocomposites, while the presence of water decelerated it. The photopolymerization of nanocomposites was more sensitive to oxygen than that of pristine EA.

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Section: Preparation and Modification Of Colloidal Silica Particlesmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Kinetic investigations on the UV‐induced photopolymerization of nanocomposites by FTIR spectroscopy

Zhou

You

et al. 2005

J of Applied Polymer Sci

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“…The hydrol-D. Yang et al Furthermore, the contact angles for water of the polysilsesquioxane film and pure SiO 2 film were 68 ± 2° and 38 ± 2, respectively. In comparison with the organically modified SiO 2 sol film with trimethysilyl coupling agent, [22][23][24][25] the present polysilsesquioxane film's hydrophobicity was somewhat limited, which is attributed to the hydrophilic characteristic of -NH-and C=O in the polysilsesquioxane.…”

Section: Resultsmentioning

confidence: 69%

Highly moisture-proof polysilsesquioxane coating prepared via facile sol-gel process

Yang

Xü

Zhang

et al. 2006

J Coat. Technol. Res.

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A highly moisture-proof polysilsesquioxane coating was obtained from a new bis-silylated precursor, which was synthesized from 3-aminopropyltriethoxysilane (APTES) and m-xylylene diisocyanate (m-XDI) in tetrahydrofuran (THF) and verified by 1 H MAS NMR. For direct comparison purposes, an SiO 2 coating was also prepared by the Stöber method using tetraethoxysilane (TEOS) as the reactant. Interestingly, the coating obtained from the polysilsesquioxane sol exhibited a much higher moisture resistance capability than its counterpart, which was attributed to its more compact feature between nanoparticles as characterized by N 2 absorption experiment and transmission electron microscopy (TEM). Furthermore, its high transparency of about 92% showed potential for application in the protection of optical crystals. S ince Stöber developed the sol-gel method more than 30 years ago, 1 remarkable new opportunities have been created to prepare hybrid materials for employment in numerous fields, ranging from microelectronics to healthcare. 2-4 The hybrid materials obtained by the solgel reaction can provide high thermal stability 5 and good mechanical strength, 6,7 such as the large values of the ultimate strength and the rupture energy to the organic polymers, and show high transparency for optical materials 8,9 as well as contact lenses. 10 Recently, there has been a great deal of interest by chemists, physicists, material scientists and integration engineers in preparing polysilsesquioxane through the sol-gel process with the goal of developing low dielectric insulators in microelectronic devices, 11,12 and novel reinforcing elements for hybrid composites. 13-17 Because polysilsesquioxane with an organic group has a low dielectric constant and low moisture absorption compared to silica, it has already been proposed as a replacement for silicon dioxide. 15,18,19 To date, although several kinds of functional films derived from polysilsesquioxane sols have been reported, such as excellent hydrophobic films 15 and photoelectric films, 20,21 few reports on high quality polysilsesquioxane moistureproof coating have been published.In this work, we prepared a moisture-proof coating derived from m-xylylene diureidopropyltriethoxysilane (m-XDUPTES). The highly moisture resistance of the coating was clearly evidenced by putting several color-variable silica gel particles coated with polysilsesquioxane sol into water. It was found that these color-variable silica gel particles retained their original color unchanged for more than 100 hr. EXPERIMENTAL Synthesis of the New PrecursorThe following ingredients were used: 3-aminopropyltriethoxysilane (APTES, 99%, Acros), m-xylylene diisocyanate (m-XDI 99%, TOKYO KASEI), tetraethoxysilane (TEOS, 99%, Acros), NH 4 OH (Reagent Grade 26-30% NH 3 ), tetrahydrofuran (THF, dehydrated), EtOH (dehydrated), and deionized water.Scheme 1-Synthesis of m-XDUPTES.

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“…To reduce microdefect density and absorption, and improve LIDT of coating, researchers have developed many methods, such as laser conditioning, ion post-treatment [5] , effective cleaning process [6] , modifying sols [7] and maintaining pressures [8] and temperature during deposition [9] . Silica AR coatings prepared by the solgel method have been widely used in high-power laser systems owing to its excellent optical performance, low cost, thermal mechanical properties and relatively high LIDT [10][11][12][13] . The common method of improving the quality of AR coating is to modify silica sol with polyvinyl butyral (PVB) [14] or polyvinylpyrrolidone (PVP) [15] .…”

Section: Introductionmentioning

confidence: 99%

Hexagonal boron nitride nanosheets incorporated antireflective silica coating with enhanced laser-induced damage threshold

Wang

et al. 2018

High Pow Laser Sci Eng

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Boron nitride (BN) nanosheets incorporated silica antireflective (AR) coating was successfully prepared on fused silica substrate to improve the antilaser-damage ability of transmissive optics used in high-power laser systems. The BN nanosheets were obtained by urea assisted solid exfoliation, and then incorporated into basic-catalyzed silica sols without any further treatment. The transmission electron microscope (TEM) images indicated that the BN nanosheets generally consisted of 2-10 layers. The antireflective BN/SiO 2 coating exhibited excellent transmittance as high as 99.89% at 351 nm wavelength on fused silica substrate. The thermal conductivity 0.135 W · m −1 · K −1 of the BN/SiO 2 coating with 10% BN addition was about 23% higher than 0.11 W · m −1 · K −1 of the pure SiO 2 AR coating. The laser-induced damage threshold (LIDT) of that BN/SiO 2 coating is also 23.1% higher than that of pure SiO 2 AR coating. This research provides a potential application of BN/SiO 2 coatings in high-power laser systems.

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Surface chemistry and trimethylsilyl functionalization of Stöber silica sols

Cited by 119 publications

References 28 publications

Kinetic investigations on the UV‐induced photopolymerization of nanocomposites by FTIR spectroscopy

Kinetic investigations on the UV‐induced photopolymerization of nanocomposites by FTIR spectroscopy

Highly moisture-proof polysilsesquioxane coating prepared via facile sol-gel process

Hexagonal boron nitride nanosheets incorporated antireflective silica coating with enhanced laser-induced damage threshold

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