2016
DOI: 10.1016/j.jallcom.2016.07.013
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Surface characteristics for the Ti Al N coatings deposited by high power impulse magnetron sputtering technique at the different bias voltages

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Cited by 61 publications
(20 citation statements)
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“…During further increase of the substrate bias, Cr2N (111) becomes the dominant reflection. Changes of bias voltages may also cause reflection shifting in the XRD spectra, and such a peak shift to lower 2θ values was observed for Cr2N (110) with increasing bias voltage, related to the chemical composition change [24,42]. After hydrogenation, the intensities of the peaks of CrN and Cr2N phases changed.…”
Section: Crystalline Structurementioning
confidence: 99%
See 1 more Smart Citation
“…During further increase of the substrate bias, Cr2N (111) becomes the dominant reflection. Changes of bias voltages may also cause reflection shifting in the XRD spectra, and such a peak shift to lower 2θ values was observed for Cr2N (110) with increasing bias voltage, related to the chemical composition change [24,42]. After hydrogenation, the intensities of the peaks of CrN and Cr2N phases changed.…”
Section: Crystalline Structurementioning
confidence: 99%
“…Furthermore, phase composition plays an important role, because the Cr2N phase exhibits better mechanical properties (hardness and elastic modulus) due to higher covalent bonding character in Cr2N than the CrN phase [32,47]. Hardness evolution can be attributed to grain size, texture components, and the residual stress as well [42]. The low hardness of the deposited coatings could be attributed to (1) chromium phase precipitation at the grain boundaries of CrN and Cr2N phases causing increased grain boundary sliding, and (2) enhanced dislocation movement in the coating.…”
Section: Mechanical Propertiesmentioning
confidence: 99%
“…Six series of Cr-Cu-N coatings with various Cu content were deposited by hybrid coating system combining a radio frequency (RF) and a pulsed DC (PDC) sputtering, which was schematically shown in previous reports [ 19 ]. The Cr target and Cu target were connected with PDC and RF power sources, respectively.…”
Section: Experiments Detailsmentioning
confidence: 99%
“…This improvement is mainly caused by the Hall-Petch effect [11][12][13]. Other studies explain hardness decrease (or increase) as a combination of microstructural characteristics such as grain size effect, texture and residual stresses related to the coating deposition parameters [14].…”
Section: Introductionmentioning
confidence: 99%