Surface and sub-surface reactions during low temperature aluminium oxide atomic layer deposition on fiber-forming polymers

Surface modification of thin film composite polyamide membrane using atomic layer deposition method

“…The decrease of the peak intensities was more prominent for thicker coating layers, which can be explained by the dilution effect due to the presence of the coating material. In addition, the decrease in the peak intensity at 1660 cm -1 and 1540 cm -1 might be partially attributed to the reaction of AlMe 3 precursors with C=O groups of PA (to produce C-O-Al bonds) [11,12] and N-H groups (to form Al-N bonds) [11,12], respectively. In addition, the coated membranes showed the appearance of a new low intensity peak at 1150 cm -1 , which may originate from residues of unreacted Al-CH 3 group of the AlMe 3 precursor [11,12].…”

“…In addition, the change in the ALD processing temperature has affected on reactivity of AlMe 3 [11]. For example, the most hydrophilic membrane surface has been obtained at 150 ºC [14].…”

“…Recent advancement in ALD technology has increased its potential to produce functional thin films on flexible and temperaturesensitive polymeric materials [8,9]. The technology has also been applied to coat various fibrous polymers [10,11,12,13].…”

Progress and future directions for atomic layer deposition and ALD-based chemistry

“…Infrared spectroscopy results indicate, for example, that TMA readily diffuses into polypropylene, but TMA does not react with the polymer. 36 At higher temperatures, enhanced diffusion leads to surface roughening that is not observed for coatings formed at lower temperatures ( Figure 5 ). 35 Pulsed or sequential vapor infi ltration can also completely saturate the bulk/precursor reaction, yielding full chemical modifi cation of the starting polymer.…”

Hydrophilization of porous polypropylene membranes by atomic layer deposition of TiO2 for simultaneously improved permeability and selectivity

“…Al 2 O 3 , ZrO 2 , TiO 2 and so on) have been investigated on various types of polymer substrates during the ALD process [18][19][20][21][22][23][24][25]. A model was proposed for the ALD precursors' adsorption on surface and diffusion into the subsurface of polymers without active groups [19], and it was found that the process temperature significantly affected the interface between the deposition layer and the substrate [26,27]. There are some reports on the deposition of metal oxides by ALD on PP substrates but most studies are focused on the deposition of metal oxides, mainly Al 2 O 3 , on nonporous PP films [19,[27][28][29][30].…”