2016
DOI: 10.1021/acs.jpcc.5b11631
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Surface and Near Surface Area Density of States for Magnetron-Sputtered ZnO and Al-ZnO: A MIES, UPS, and VBXPS Study Investigating Ultrahigh Vacuum Sputter Cleaning and UV Oxygen Plasma

Abstract: The impact of nonsolvent-based cleaning methods on zinc oxide and aluminum-doped zinc oxide was investigated across a range of doping concentrations up to 25% aluminum. A combination of electron spectroscopic techniques was utilized in order to characterize the electronic states present on the surface and to discern the differences between the near surface area and outermost layer valence band states. Understanding the differences between the near surface area and outermost layer of an interface is crucial whe… Show more

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Cited by 8 publications
(4 citation statements)
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References 65 publications
(142 reference statements)
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“…III B 1, due to our slightly lower formation energies and usage of the experimental value of H (ZnO), our calculated E f (V O ) in O-poor conditions are significantly lower than those of other DFT studies, at about 0.05 eV for PBE0 and B97-2 and 0.19 eV for BB1k (see Table III). Such a low formation energy would indicate high nonstoichiometry in extreme reducing conditions, for which there is some experimental evidence [183][184][185], but measurements to investigate the intrinsic electrical conductivity properties of ZnO tend to be performed under less extreme conditions [36,88,186]. From such a low formation energy, we determine very high [V O ], of the order of 10 22 cm −3 for T > 400 K, using the PBE0 and B97-2 functionals.…”
Section: Charge Carrier and Defect Concentrationsmentioning
confidence: 98%
“…III B 1, due to our slightly lower formation energies and usage of the experimental value of H (ZnO), our calculated E f (V O ) in O-poor conditions are significantly lower than those of other DFT studies, at about 0.05 eV for PBE0 and B97-2 and 0.19 eV for BB1k (see Table III). Such a low formation energy would indicate high nonstoichiometry in extreme reducing conditions, for which there is some experimental evidence [183][184][185], but measurements to investigate the intrinsic electrical conductivity properties of ZnO tend to be performed under less extreme conditions [36,88,186]. From such a low formation energy, we determine very high [V O ], of the order of 10 22 cm −3 for T > 400 K, using the PBE0 and B97-2 functionals.…”
Section: Charge Carrier and Defect Concentrationsmentioning
confidence: 98%
“…In order to be used as a transparent electrode, AZO films need to have a resistivity in the order of 10 –4 Ω·cm, while being transparent in the visible range. AZO films can be produced by various methods, such as magnetron sputtering, spray pyrolysis, or chemical vapor deposition . Recently, the possibility of depositing highly conductive AZO films close to room temperature (about 45 °C) has been shown using high power impulse magnetron sputtering (HiPIMS) .…”
Section: Introductionmentioning
confidence: 99%
“…The UPS spectra, which measure the DOS of the valence band, show two prominent peaks at 4.5 and 10.5 eV, which are from the O 2p orbitals (lone pair) and Zn 3d band, respectively. 35 In the UV−ozone treated sample, the peaks shift toward higher binding energies. Specifically, the two curves have the same shape, but the treated spectrum is shifted by 0.4 eV compared to the nontreated one.…”
Section: Resultsmentioning
confidence: 98%
“…The UPS spectra of the treated and nontreated ZnO films are plotted in Figure c. The UPS spectra, which measure the DOS of the valence band, show two prominent peaks at 4.5 and 10.5 eV, which are from the O 2p orbitals (lone pair) and Zn 3d band, respectively . In the UV–ozone treated sample, the peaks shift toward higher binding energies.…”
Section: Resultsmentioning
confidence: 99%