Surface and displacement damage engineering on CdSe nanocrystalline thin film by swift heavy Ag ions: A theoretical investigation by SRIM/TRIM package

Nath, Debojyoti; Das, Ratan

doi:10.1016/j.vacuum.2021.110293

Cited by 12 publications

(4 citation statements)

References 15 publications

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“…There is also a correlation between the depth of N c and d) (CB). Using SRIM-TRIM simulations, 32 we find that the abundant "O" vacancies inside ZnO under sputtering can be induced by subsequent irradiation with N + . The bandgap closes with more oxygen vacancies,nd ZnO may absorb more visible light.…”

Section: Morphological Studies-figuresmentioning

confidence: 98%

Effects of 300 keV N⁺ Ion Irradiation on Radio-Frequency Sputtered Al-ZnO Thin Films for a Low Energy Regime

Sharma

Gupta

Singh

et al. 2023

ECS J. Solid State Sci. Technol.

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The experimentally observed effects induced by ion irradiation in AZO thin films are discussed in limited articles. Here, we report the results of ion irradiation by 300 keV Nitrogen ions. To study the structural, morphological, and optical properties of thin film, X-ray diffraction, field-emission scanning electron microscopy, and UV-visible spectroscopy were used and it was confirmed by the structural investigation that the ion irradiation resulted in changes in different calculated structural parameters. Furthermore, different dopant concentrations are examined in relation to the effects of irradiation. The polar crystal growth orientation mechanism is initiated over nonpolar crystal growth orientation, as the 2%AZO thin films are presented to ion beam irradiation. The transition in the stress of thin film after N ion irradiation is also discussed. The phenomena responsible for the morphological changes is discussed. The observed morphological changes are correlated with structural changes. The change in the colour of the thin films after irradiation is explained. The other alterations in the thin films' optical properties are also discussed. The systematics study of the irradiated thin films may be helpful for device fabrication.

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Section: Morphological Studies-figuresmentioning

confidence: 98%

Effects of 300 keV N⁺ Ion Irradiation on Radio-Frequency Sputtered Al-ZnO Thin Films for a Low Energy Regime

Sharma

Gupta

Singh

et al. 2023

ECS J. Solid State Sci. Technol.

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“…Subsequent irradiation using N + can induce the prominent "O" vacancies inside V 2 O 5 under preferential sputtering, as observed using SRIM-TRIM simulations. 28 The bandgap narrows as a result of an increase in oxygen vacancies, which is known to increase ZnO' absorption of visible light. 29 So, as illustrated in Fig.…”

Section: Williamson and Smallman Suggested The Equationmentioning

confidence: 99%

Tuning of Structural and Morphological Characteristics of V₂O₅ Thin Films Using Low Energy 16 keV N + for Optical and Wetting Applications

et al. 2023

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Effect of nitrogen (N+) ion implantation on the morphological, structural, optical, and compositional properties of vanadium pentoxide (V2O5) thin films grown on glass substrates is studied. Surface morphology shows the formation of grains and the growth dynamics is governed by roughness (α) and growth (β) exponents. X-ray diffraction studies reveal that V2O5 exists in a hybrid form, with properties of both the orthorhombic and tetragonal phases. Ion implantation induces defects and strain in V2O5 thin films causing a reduction in crystalline properties and deformation in the β-phase with a corresponding change in crystallite size. Contact angle wetting properties are found to be co-related with fractal growth of the films under ion implantation. Oxygen vacancies and electron scattering/trapping centres are revealed to have increased after N+ implantation, leading to a smaller bandgap in the thin films. The benefits of decreasing the optical band-gap of V2O5 thin films for optical applications are outlined in the present work.

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“…The target thickness of 50 μm is considered in the simulation process [37]. The average ion range has been obtained from the TRIM as 22.7 μm.…”

Section: Simulation-ion Matter Interactionmentioning

confidence: 99%

Structural and optical properties of lithium borate glasses under extreme conditions of ion irradiation

et al. 2023

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Lithium borate (LBO) glasses of the composition 10LiO2.90B2O3 were prepared by melt quenching technique and characterized for morphological, structural, and optical properties before and after the exposure to the extreme conditions of 100 MeV Ni ion irradiation. Both the morphological images and structural properties confirm the transformation of LBO glasses from amorphous to polycrystalline nature. This Ni irradiation provides thermal energy that causes the ceramization of glass. The beam interacts with the material where the top layer of the glass remelts, and ultrafast re-solidification occurs after the termination of the ion beams. The Rietveld refinement using the X-ray diffraction data shows that the irradiated LBO possesses a monoclinic crystal structure of lithium pentaborate pentahydrate (B5H10LiO13). The FTIR spectra of Ni ion irradiated glasses show the creation of non-bridging oxygens (NBO) by the formation of BO4 units at the expense of BO3 units. The direct band gap and the Urbach energy of the glasses are affected by the nickel ion irradiation and are in the range 2.73 to 2.55 eV and 0.59 to 0.42 eV. The refractive index also reveals a minor change (1.66 to 1.63). The molar electronic polarizability, metallization criteria, and transmission coefficient were estimated. The coexistence of crystalline and amorphous phases leads to a multiscale phase structure that has multilevel relaxation processes. This is a suitable condition for the improvement of the rheological properties of glass and glass ceramics. Future work involves optimization of the coexistence of these two phases during irradiation.

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Surface and displacement damage engineering on CdSe nanocrystalline thin film by swift heavy Ag ions: A theoretical investigation by SRIM/TRIM package

Cited by 12 publications

References 15 publications

Effects of 300 keV N⁺ Ion Irradiation on Radio-Frequency Sputtered Al-ZnO Thin Films for a Low Energy Regime

Effects of 300 keV N⁺ Ion Irradiation on Radio-Frequency Sputtered Al-ZnO Thin Films for a Low Energy Regime

Tuning of Structural and Morphological Characteristics of V₂O₅ Thin Films Using Low Energy 16 keV N + for Optical and Wetting Applications

Structural and optical properties of lithium borate glasses under extreme conditions of ion irradiation

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Surface and displacement damage engineering on CdSe nanocrystalline thin film by swift heavy Ag ions: A theoretical investigation by SRIM/TRIM package

Cited by 12 publications

References 15 publications

Effects of 300 keV N+ Ion Irradiation on Radio-Frequency Sputtered Al-ZnO Thin Films for a Low Energy Regime

Effects of 300 keV N+ Ion Irradiation on Radio-Frequency Sputtered Al-ZnO Thin Films for a Low Energy Regime

Tuning of Structural and Morphological Characteristics of V2O5 Thin Films Using Low Energy 16 keV N + for Optical and Wetting Applications

Structural and optical properties of lithium borate glasses under extreme conditions of ion irradiation

Contact Info

Product

Resources

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Effects of 300 keV N⁺ Ion Irradiation on Radio-Frequency Sputtered Al-ZnO Thin Films for a Low Energy Regime

Effects of 300 keV N⁺ Ion Irradiation on Radio-Frequency Sputtered Al-ZnO Thin Films for a Low Energy Regime

Tuning of Structural and Morphological Characteristics of V₂O₅ Thin Films Using Low Energy 16 keV N + for Optical and Wetting Applications