2021
DOI: 10.1002/smll.202105184
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Surface‐Anchored Acetylcholine Regulates Band‐Edge States and Suppresses Ion Migration in a 21%‐Efficient Quadruple‐Cation Perovskite Solar Cell

Abstract: Although incorporating multiple halogen (bromine) anions and alkali (rubidium) cations can improve the open‐circuit voltage (Voc) of perovskite solar cells (PSCs), severe voltage loss and poor stability have remained pivotal limitations to their further commercialization. In this study, acetylcholine (ACh+) is anchored to the surface of a quadruple‐cation perovskite to provide additional electron states near the valence band maximum of the perovskite surface, thereby enhancing the band alignment and minimizing… Show more

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Cited by 36 publications
(24 citation statements)
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“…1b, in which the 3D wide-bandgap perovskite system is Rb 0.05 Cs 0.05 (FAPbI 3 ) 0.83 (MAPbBr 3 ) 0.17 (bandgap = 1.63 eV) prepared from a one-step anti-solvent method, following our previous reports. 36,37…”
Section: Resultsmentioning
confidence: 99%
“…1b, in which the 3D wide-bandgap perovskite system is Rb 0.05 Cs 0.05 (FAPbI 3 ) 0.83 (MAPbBr 3 ) 0.17 (bandgap = 1.63 eV) prepared from a one-step anti-solvent method, following our previous reports. 36,37…”
Section: Resultsmentioning
confidence: 99%
“…Under the synergistic effects of the additive and surface-modification agent, the TIDP film reveals both large grain size and smoother surface morphology (with the roughness of 17.2 nm), thus facilitating the charge transport process in the bulk perovskite film and the carrier extraction process at the interface simultaneously. 31,32 Then, X-ray diffraction (XRD) patterns were measured to explore the impact of trometamol molecules on the crystallinity of perovskite films. As illustrated in Figure 4a, the BP film exhibits remarkably enhanced diffraction peaks of 14.2°and 28.5°, which are assigned to diffraction from (110) and (220) planes.…”
mentioning
confidence: 99%
“…To further confirm the beneficial effects of the TIDP strategy on the defect passivation process, the space charge limited current (SCLC) method was employed to quantify the defect density by means of the device architecture of ITO/ SnO 2 /MAPbI 3 /PCBM/Cu (Figure 5e). The concentration of defect density (N Trap ) is calculated according to the following equation: 31 N V qL…”
mentioning
confidence: 99%
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