Molecular self-assembly has over the past decades attracted significant attention due to its novel structural organizations and potential applications in advanced nanotechnology. Studies have in particular concerned block copolymer systems of various architectures which have been shown to form highly ordered nanometer scaled structures in the bulk, 1,2 in solution, 3 or in thin films. 4 Block copolymer lithography has drawn special attention due to the wide range of potential applications within the microelectronics industry. [4][5][6] The characteristic length scale of these polymeric systems is in the range 1-10 nm as determined by the overall size of the polymer coil. Even though this nanometer length scale is attractive for a variety of future developments, many applications will remain restricted domain structures approaching the scale of visible light wavelengths, e.g., memory devices addressed by laser light and photonic band-gap materials. As a result, it remains a challenge to control molecular selfassembly on an even larger scale to create micrometer patterning. Some success in this area has been achieved by synthesizing molecules of extreme molar masses, 7 by swelling the nanoscale structures into microscale, 8 and by the assembly of shell crosslinked nanoparticles. 9 Another approach has been to utilize the selective wetting of thin-film block copolymers to a surface where mismatch between thickness and domain size may lead to the formation of micrometer scaled islands or holes. 10-12 A more recent approach has been to utilize self-organization from a receding meniscus in dewetting processes, leading to aligned micrometer-scale lamellae. 13 Recently, there have been reports on molecular assemblies of dendrimers and other highly branched molecules. Tsukruk et al., for example, reported self-association into nanometer thick, macroscopically long molecular fibers, where the driving forces were speculated being related to hydrogen bonding, π-bonding, crystallization, or combinations of these. 13,14 Thayumanavan et al. showed amphiphilic dendrimers, which on substrates associate into superhydrophobic films, given by disklike assemblies of roughly 200 nm diameter. 15 We show in this Communication that a new dendrimer-based system spontaneously self-assembles into a thin film of highly ordered micrometer-scale domain structure. The system used is based on a series of uracil-PAMAM dendrimers from generation 0 (tetrafunctional) to generation 4 (64 chain endfunctional groups) mixed with the organosilane coupling agent (3-(methylamino)propyl)trimethoxysilane (MAP). The uracil-PAMAM dendrimers were synthesized by coupling the synthesized uracil-1-acetic acid with the free primary amino groups at the chain ends of commercially available PAMAM dendrimers (Aldrich). 17 MAP reactant was obtained from Aldrich and used without further purification. Films were made by mixing 2 mg of the uracil-PAMAM dendrimer into a 1 mL solution of 1 wt % MAP in Milli-Q water. The mixture was filtered through a 0.22 µm Millex-GS to en...