The influence of Sb content, substrate type and cap layers on the quantum anomalous Hall effect observed in V-doped (Bi,Sb)2Te3 magnetic topological insulators is investigated. Thin layers showing excellent quantization are reproducibly deposited by molecular beam epitaxy at growth conditions effecting a compromise between controlled layer properties and high crystalline quality. The Sb content can be reliably determined from the in-plane lattice constant measured by X-ray diffraction, even in thin layers. This is the main layer parameter to be optimized in order to approach charge neutrality. Within a narrow range at about 80% Sb content, the Hall resistivity shows a maximum of about 10 kΩ at 4 K and quantizes at mK temperatures. Under these conditions, thin layers grown on Si(111) or InP(111) and with or without a Te cap exhibit quantization. The quantization persists independently of the interfaces between cap, layer and substrate, the limited crystalline quality, and the degradation of the layer proving the robustness of the quantum anomalous Hall effect.A quantum anomalous Hall effect (QAHE), in which a Hall plateau with a resistance of h/e 2 can be observed even in the absence of a magnetic field, was predicted to occur in ferromagnetically doped topological insulators (TIs) [1][2][3][4]. The effect was first observed in 2013 in a 5 nm Cr 0.15 (Bi 0.1 Sb 0.9 ) 1.85 Te 3 layer without a cap layer, and grown on a SrTiO 3 substrate [5]. The QAHE has since been reproduced in such tetradymite-type layers with different layer thicknesses, layer compositions, magnetic dopants (Cr or V), with/without a cap layer and on various substrates [6][7][8][9][10][11]. Perfect quantization was observed in Cr-doped (Bi,Sb) 2 Te 3 layers capped by an AlO x layer on GaAs substrates, and V-doped (Bi,Sb) 2 Te 3 layers capped by Te on SrTiO 3 substrates and Si(111) substrates [6,[9][10][11]. Many authors point out that the layer properties have to be optimized to observe the QAHE, but details of the epitaxial growth conditions, the structural layer properties and the applied characterization techniques are sparse.An apparent requirement for observing the QAHE is the optimization of Sb content in order to approach charge neutrality by compensation of n-and p-type intrinsic point defects. Further, an applied gate bias is needed to tune the Fermi level into the bandgap of topological surface states (TSSs) caused by magnetization [5]. The layer thickness, ranging from about 4 to 10 nm in the literature, likely affects the hybridization of the TSSs and possibly also the mechanisms leading to the QAHE. Theoretical predictions and experiments both reveal a degradation of the surface states due to oxidation in Bi 2 Te 3 layers and shifts of the Fermi level in epitaxial tetradymite layers due to adsorbates [12][13][14][15]. The influence of the interfaces between the layer and the sub- * M. Winnerlein and S. Schreyeck contributed equally to this work.† Karl.Brunner@physik.uni-wuerzburg.de strate, as well as between the layer and either an...