2011
DOI: 10.1080/07370652.2010.529100
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Suppressing H2Evolution by Silicon Powder Dispersions

Abstract: Silicon dispersions in water are used to produce pyrotechnic time delay compositions. The propensity of the silicon to react with water and to produce hazardous hydrogen gas must be suppressed. To this end the effect of surface modifications and medium pH on the rate of corrosion of silicon were studied at ambient temperature. It was found that the rate of hydrogen evolution increased with increasing pH. Silanes proved to be more effective silicon corrosion inhibitors than alcohols, with vinyl tris (2-methoxye… Show more

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Cited by 12 publications
(7 citation statements)
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“…Neat silicon produced 13.7 ± 1.0 mmol H 2 /kg Si in one hour when ultrasonically agitated. This represents a 65 % increase in the hydrogen gas output compared to the result previously reported using magnetic stirring for the same powder (Tichapondwa et al, 2011). Figure 7 shows a two-step inhibition process with an initial step decrease to 9.3 ± 0.4 mmol H 2 /kg Si for silicon heated at 75 °C.…”
Section: Comparison With Previous Worksupporting
confidence: 46%
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“…Neat silicon produced 13.7 ± 1.0 mmol H 2 /kg Si in one hour when ultrasonically agitated. This represents a 65 % increase in the hydrogen gas output compared to the result previously reported using magnetic stirring for the same powder (Tichapondwa et al, 2011). Figure 7 shows a two-step inhibition process with an initial step decrease to 9.3 ± 0.4 mmol H 2 /kg Si for silicon heated at 75 °C.…”
Section: Comparison With Previous Worksupporting
confidence: 46%
“…These results were then compared with those obtained for other methods of suppressing of hydrogen evolution (Tichapondwa et al, 2011 andTichapondwa et al 2012).…”
Section: Introductionmentioning
confidence: 99%
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“…The results show that neat silicon produced 13.7 AE 1.0 mmol H 2 kg À1 silicon in 1 h when ultrasonically agitated. This represents a 65 % increase in the hydrogen gas output compared to the result previously reported using magnetic stirring [19] for the same powder. Table 1 shows that the d 50 of the neat and heat-treated silicon particles decreased after 1 h ultrasonic agitation.…”
Section: Characterizationsupporting
confidence: 43%
“…The rate of reaction of an untreated silicon powder with water is thus negligible unless some method of removing the oxide layer is employed. The overall reaction of silicon with water has been described in previous work by Tichapondwa et al [18,19] and is represented by Equations (1) and (2).…”
Section: Introductionmentioning
confidence: 99%