Supersonically expanding cascaded arc plasma properties: comparison of Ne, Ar and Xe

Selezneva, S. E.; Boulos, M.; Letourneur, Kgy Karine; Hest, van Mfam Maikel; Sanden, van de Mcm Richard; Schram, DC Daan

doi:10.1088/0963-0252/12/1/314

Cited by 10 publications

(6 citation statements)

References 34 publications

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“…Even though the input power in the Ar plasma is lower than that in the He plasma, it is evident that both n e and T e are significantly higher in the Ar plasma than in the He plasma. The results are comparable to those obtained in the work of Selezneva et al, which explored the cascaded arc plasma characteristics in Ne, Ar, and Xe gases using mathematical modeling [23]. It was also found that both n e and T e in Xe plasma are higher than n e and T e in Ar plasma, whereas n e and T e in Ar plasma are higher than n e and T e in Ne plasma.…”

Section: Comparison Of Ne and Te Between He And Ar Plasmasupporting

confidence: 87%

“…As shown in figure 5(a), the n e in cascaded arc Ar plasma is much higher than that in He plasma so that the threebody recombination can more effectively heat the electrons in Ar plasma. In fact, in Selezneva et al [23], it is also found that the electron gas is heated more effectively by recombination in Xe plasma than in Ar plasma, and the same is true for Ar and Ne. Therefore, the three-body recombination reaction in He plasma produces less energy for the electrons than it does in Ar plasma.…”

Section: Comparison Of Ne and Te Between He And Ar Plasmamentioning

confidence: 88%

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Observation of the low electron density and electron temperature in an unmagnetized cascaded arc helium plasma by laser Thomson scattering approach

Wang,

Zhou,

Shi

et al. 2024

Plasma Phys. Control. Fusion

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In this study, the electron density (ne ) and temperature (Te ) in an unmagnetized cascaded arc He plasma are precisely determined using cutting-edge laser Thomson scattering. In our experimental scope, ne is only 1018 m-3 and Te is less than 0.2 eV, both of which are substantially lower than those in the linear plasma devices. The comparison of ne and Te in He plasma with those in cascaded arc Ar plasma reveals that these two parameters are likewise significantly lower in He plasma than they are in Ar plasma on average. In comparison to Ar gas, the degree of ionization of He is low due to its high ionization potential, and diffusive loss dominates due to its light weight, both of which result in a lower ne . Meanwhile, these two characteristics render the three-body recombination interaction between electrons and He+ ions in He plasma insignificant, thus the electrons cannot be heated effectively, explaining why Te is lower. The study will provide foundational data and build the groundwork for a thorough knowledge of cascaded arc He plasma in linear plasma devices.

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Section: Comparison Of Ne and Te Between He And Ar Plasmasupporting

confidence: 87%

Section: Comparison Of Ne and Te Between He And Ar Plasmamentioning

confidence: 88%

Observation of the low electron density and electron temperature in an unmagnetized cascaded arc helium plasma by laser Thomson scattering approach

Wang,

Zhou,

Shi

et al. 2024

Plasma Phys. Control. Fusion

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“…We simulate the plasma flow using an axisymmetric model [26,31,35,36]. Since the ionization degree of the argon plasma is low (∼10%) [1,33], and the plasma becomes recombining in the downstream of the expanding plasma jet [26], the plasma flow dynamics can be modeled assuming a neutral hot gas expansion.…”

Section: Simulation Of the Plasma Expansionmentioning

confidence: 99%

Improved size distribution control of silicon nanocrystals in a spatially confined remote plasma

Doğan

Westerman

Sanden

2015

Plasma Sources Sci. Technol.

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This work demonstrates how to improve the size distribution of silicon nanocrystals (Si-NCs) synthesized in a remote plasma, in which the flow dynamics and the particular chemistry initially resulted in the formation of small (2-10 nm) and large (50-120 nm) Si-NCs. Plasma consists of two regions: an axially expanding central plasma beam and a background region around the expansion. Continuum fluid dynamics simulations demonstrate that a significant mass flow occurs from the central beam to the background region. This mass flow can be gradually reduced upon confinement of the central beam, preventing the mass transport to the background region. Transmission electron microscopy and Raman spectroscopy analyses demonstrate that the volume fraction of large Si-NCs decreases from ∼77% to below 45% in parallel with the decrease of mass flow to the background region upon confinement, which indicates that large Si-NCs are synthesized in the background and small Si-NCs are synthesized in the central beam. Spatially resolved ion flux analyses demonstrate that the ions are localized in the central beam despite the mass flow to the background, indicating that the formation of small Si-NCs is governed by ion-assisted growth while the formation of large Si-NCs is governed by radical-neutral-assisted growth in the absence of ions. According to these observations, a better uniformity in the size distribution of Si-NCs can be obtained by creating a more uniform plasma flow and controlling the density of plasma species in the plasma.

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“…[1][2][3][4][5][6][7][8][9][10][11] The particular application addressed here employs an Ar/ H 2 plasma, in the form of a dc arc jet, for methane activation and subsequent chemical vapor deposition ͑CVD͒ of polycrystalline diamond. [12][13][14][15][16][17][18][19][20] For completeness, we note that microwave-activated hydrocarbon/H 2 / Ar gas mixtures find even more widespread use for growing both CVD of single crystal, 21 microcrystalline, 22 and ͑at very low H 2 partial pressures͒ ultrananocrystalline diamond films.…”

Section: Introductionmentioning

confidence: 99%

Measurement and modeling of a diamond deposition reactor: Hydrogen atom and electron number densities in an Ar∕H2 arc jet discharge

Rennick

Engeln

Smith

et al. 2005

Journal of Applied Physics

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Please check the document version of this publication:• A submitted manuscript is the version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal.If the publication is distributed under the terms of Article 25fa of the Dutch Copyright Act, indicated by the "Taverne" license above, please follow below link for the End User Agreement: A combination of experiment ͓optical emission and cavity ring-down spectroscopy ͑CRDS͒ of electronically excited H atoms͔ and two-dimensional ͑2D͒ modeling has enabled a uniquely detailed characterization of the key properties of the Ar/ H 2 plasma within a ഛ10-kW, twin-nozzle dc arc jet reactor. The modeling provides a detailed description of the initial conditions in the primary torch head and of the subsequent expansion of the plasma into the lower pressure reactor chamber, where it forms a cylindrical plume of activated gas comprising mainly of Ar, Ar + , H, ArH + , and free electrons. Subsequent reactions lead to the formation of H 2 and electronically excited atoms, including H͑n =2͒ and H͑n =3͒ that radiate photons, giving the plume its characteristic intense emission. The modeling successfully reproduces the measured spatial distributions of H͑n Ͼ 1͒ atoms, and their variation with H 2 flow rate, F H 2 0 . Computed H͑n =2͒ number densities show near-quantitative agreement with CRDS measurements of H͑n =2͒ absorption via the Balmer-␤ transition, successfully capturing the observed decrease in H͑n =2͒ density with increased F H 2 0 . Stark broadening of the Balmer-␤ transition depends upon the local electron density in close proximity to the H͑n =2͒ atoms. The modeling reveals that, at low F H 2 0 , the maxima in the electron and H͑n =2͒ atom distributions occur in different spatial regions of the plume; direct analysis of the Stark broadening of the Balmer-␤ line would thus lead to an underestimate of the peak electron density. The present study highlights the necessity of careful interco...

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Supersonically expanding cascaded arc plasma properties: comparison of Ne, Ar and Xe

Cited by 10 publications

References 34 publications

Observation of the low electron density and electron temperature in an unmagnetized cascaded arc helium plasma by laser Thomson scattering approach

Observation of the low electron density and electron temperature in an unmagnetized cascaded arc helium plasma by laser Thomson scattering approach

Improved size distribution control of silicon nanocrystals in a spatially confined remote plasma

Measurement and modeling of a diamond deposition reactor: Hydrogen atom and electron number densities in an Ar∕H2 arc jet discharge

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