2021
DOI: 10.1016/j.ceramint.2021.08.229
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Superlubricity achieved with TiN coatings via the in situ formation of a carbon-based film at the sliding interfaces

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Cited by 24 publications
(12 citation statements)
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“…The pioneering research of forming carbon-based materials in situ was conducted by Erdemir et al [36], where amorphous carbon and onion-like carbon were formed from the polyalphaolefin oil by nanocrystalline catalytic coatings. In the following year, the use of oil-soluble carbon-precursor additives, e.g., cyclopropanecarboxylic acid (CPCa), was conducted to form polymeric amorphous carbon-based tribofilms [34,[37][38][39][40]. Currently, the use of catalytically active nanoparticles was also proposed to control the formation of amorphous carbon-based tribofilms [41,42].…”
Section: Introductionmentioning
confidence: 99%
“…The pioneering research of forming carbon-based materials in situ was conducted by Erdemir et al [36], where amorphous carbon and onion-like carbon were formed from the polyalphaolefin oil by nanocrystalline catalytic coatings. In the following year, the use of oil-soluble carbon-precursor additives, e.g., cyclopropanecarboxylic acid (CPCa), was conducted to form polymeric amorphous carbon-based tribofilms [34,[37][38][39][40]. Currently, the use of catalytically active nanoparticles was also proposed to control the formation of amorphous carbon-based tribofilms [41,42].…”
Section: Introductionmentioning
confidence: 99%
“…The COF values of (a) steel–steel tribopairs and (b) steel–DLC tribopairs lubricated via PAO base oil and oils containing BP and oBP. (c) The optical images and (d) 3D white-light morphology of the ball wear scar area, (e) A comparison of the contact pressure between this study and other oil lubrication systems in a superlubricity state. …”
Section: The Active Oxidation Of the Bp Nanopowdersmentioning
confidence: 99%
“…Magnetron sputtering technology was used to deposit a layer of titanium on the Al samples. 29 When the air pressure in the working chamber is pumped to less than 5 × 10 −3 pa, high-purity argon (60SCCM) was introduced to maintain the pressure at 0.5 pa. Ti film was then deposited for 3.5 h by setting the working current of 7A and the bias voltage −50 V. As shown in Figure 1, Ti film is complete, uniform, and dense, well bonded to the Al substrate. The thickness of Ti film is 711 nm.…”
Section: Preparation Of Ti Film On Al Substratementioning
confidence: 99%