2004
DOI: 10.1021/la0482507
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Superhydrophobic, High Surface Area, 3-D SiO2 Nanostructures through Siloxane-Based Surface Functionalization

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Cited by 59 publications
(38 citation statements)
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“…[80] The methods mentioned above are some of the convenient approaches for the construction of special rough surfaces with superhydrophobicity. In addition to these, many other methods have also been developed, including chemical vapor deposition (CVD), [18,81] plasma polymerization/etching of polymer films, [82,83] laser ablation and photolithography-based microfabrication, [84] self-assembly, [85][86][87] glancing-angle deposition, [88] and wet chemical deposition routes. [89][90][91] …”
Section: Crystallization Controlmentioning
confidence: 99%
“…[80] The methods mentioned above are some of the convenient approaches for the construction of special rough surfaces with superhydrophobicity. In addition to these, many other methods have also been developed, including chemical vapor deposition (CVD), [18,81] plasma polymerization/etching of polymer films, [82,83] laser ablation and photolithography-based microfabrication, [84] self-assembly, [85][86][87] glancing-angle deposition, [88] and wet chemical deposition routes. [89][90][91] …”
Section: Crystallization Controlmentioning
confidence: 99%
“…In previous studies involving various GLAD thin-film nanostructures, we used cyclic voltammetry measurements to confirm that the chemical reagent penetrates the internal pores of the thin-film matrix and readily functionalizes the underlying substrate, while post-processing SEM images suggest that functionalization does not significantly impact film morphology. [35] Hydrophobicity of the pre-and post-treated films was observed by advancing contact-angle measurements (Fig. 4).…”
Section: Functionalizationmentioning
confidence: 99%
“…GLAD provides a method for fabricating porous, nanostructured thin films with high surface area and roughness, which can be rendered hydrophobic through chemical treatments of the film surface. [35] Porosimetry has been used in the past to estimate the GLAD thin-film surface area using the Brunauer-Emmett-Teller model of gas sorption, and measurements typically vary from 9 to 120 cm 2 cm -2 (area of surface per unit of substrate area), [36][37][38] but can certainly extend beyond this range depending on the film microstructure, material, and thickness.…”
Section: Functionalizationmentioning
confidence: 99%
“…In this paper, hard anti-adhesion surfaces with low roughness and wear resistance on the aluminium substrates of rubber plastic moulds are fabricated via a new coupling method of liquid plasma and electrochemical machining. With the aid of liquid plasma thermal polishing and electrochemical anodic dissolution, micro/nano-scale binary structures [13][14][15][16][17] were prepared as the base of the anti-adhesion surfaces. First, micro-scale pit structures were framed on aluminium substrates via liquid plasma treatment with (NH 4 ) 2 SO 4 , Na 2 C 2 O 4 mixed electrolytes.…”
Section: Introductionmentioning
confidence: 99%