2018
DOI: 10.1016/j.matpr.2018.02.033
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Superhydrophobic and antireflective surface of nanostructures fabricated by CF4 plasma etching

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Cited by 3 publications
(3 citation statements)
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“…The specific chemistry of the gas, along with the parameters of the plasma (such as power, pressure, and temperature), determines the etching characteristics. This fabrication method can alter the wettability of the substrate by increasing roughness [ 82 ] or changing the functional group of the surface [ 83 , 84 , 85 , 86 ]. For example, Somrang et al [ 86 ] reported the fabrication of nanostructured patterns through CF4 plasma etching on SiO 2 -based substrates, followed by treatment with Teflon coatings to achieve superhydrophobicity and antireflection.…”
Section: Fabrication Of Superhydrophobic Surfacesmentioning
confidence: 99%
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“…The specific chemistry of the gas, along with the parameters of the plasma (such as power, pressure, and temperature), determines the etching characteristics. This fabrication method can alter the wettability of the substrate by increasing roughness [ 82 ] or changing the functional group of the surface [ 83 , 84 , 85 , 86 ]. For example, Somrang et al [ 86 ] reported the fabrication of nanostructured patterns through CF4 plasma etching on SiO 2 -based substrates, followed by treatment with Teflon coatings to achieve superhydrophobicity and antireflection.…”
Section: Fabrication Of Superhydrophobic Surfacesmentioning
confidence: 99%
“…This fabrication method can alter the wettability of the substrate by increasing roughness [ 82 ] or changing the functional group of the surface [ 83 , 84 , 85 , 86 ]. For example, Somrang et al [ 86 ] reported the fabrication of nanostructured patterns through CF4 plasma etching on SiO 2 -based substrates, followed by treatment with Teflon coatings to achieve superhydrophobicity and antireflection. Initially, nickel-thin films were deposited on the substrates using the PVD sputtering process with varying deposition times.…”
Section: Fabrication Of Superhydrophobic Surfacesmentioning
confidence: 99%
“…There are also several other methods for surface texturization. Most popular are lithography [20], plasma etching [21], chemical mask etching [22] and laser patterning [23,24].…”
Section: Introductionmentioning
confidence: 99%