“…Highly uniform, homogenous thin films are a necessity for SNSPDs, as constrictions and film inhomogeneities actively suppress the critical current of the nanowire, leading to reduced timing resolution and detection efficiency, therefore necessitating operation at lower temperatures [14]. NbN thin films for SNSPDs have typically been deposited using reactive magnetron sputtering of Nb metal with N 2 gas, however, sputtering struggles to produce uniform, pinhole-free films over large areas, being limited due to its line-of-site nature and requirement of high temperatures [15,16]. Consequently, ALD of metal nitrides has received significant interest in recent years, with several studies showcasing films with high T c and J c , essential for the fabrication of high efficiency, high temporal resolution SNSPDs [17][18][19][20].…”