Superconducting amorphous Al?Cu films of high stability

Lambrecht, A.; Leitz, H.; Hasse, J.

doi:10.1007/bf01321200

Cited by 27 publications

(10 citation statements)

References 17 publications

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“…Figures 1 and 2 are especially interested, because some experimental data. on T, = f(c) are available for BeCu and AlCu amorphous alloys [34,35]. Fig.…”

Section: Numerical Calculations and Discussionmentioning

confidence: 99%

On Superconducting Transition Temperature in Amorphous Alloys of Simple Metals

et al. 1999

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The Eliashberg equations are generalised to describe amorphous binary alloys. Equations for the electron-phonon coupling constant λ are obtained. An additional term caused by topological disorder appears in the expression for λ-constant. The features of amorphous state and their influence on a-constant and superconducting transition temperature are emphasised and analysed. Theoretical results are illustrated by numerical calculations performed for some binary amorphous alloys of simple metals.

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“…Figures 1 and 2 are especially interested, because some experimental data. on T, = f(c) are available for BeCu and AlCu amorphous alloys [34,35]. Fig.…”

Section: Numerical Calculations and Discussionmentioning

confidence: 99%

On Superconducting Transition Temperature in Amorphous Alloys of Simple Metals

et al. 1999

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“…However, the total electron interference function a(k) is known from experiment [ 5 ] . We estimated the Sii as follows.…”

Section: Calculation Of the Resistivity Pmentioning

confidence: 99%

“…The atomic volume Vat was measured by Lambrecht et al [ 5 ] , but in these calculations we use a linear but accurate fit for their Vat(x), so that no statistical errors are introduced in the calculation. Further k, was calculated for the free-electron model, using one and three free electrons per atom for Cu and Al, respectively.…”

Section: Calculation Of the Resistivity Pmentioning

confidence: 99%

“…The three functions Sii(k), which are related in a simple way to the partial interference functions aij(k) [S], have not yet been measured separately for the present alloy. However, the total electron interference function a(k) is known from experiment [ 5 ] . We estimated the Sii as follows.…”

Section: Calculation Of the Resistivity Pmentioning

confidence: 99%

“…One class of relative simple a-alloys which can be produced over a reasonable composition range are noble metal-simple metal alloys [5 to 71 where the simple metal is Mg or Al. We concentrated our attention on a-Cu,All-, experimentally studied by Lambrecht et al [5], because for the present it is the only binary alloy in this class produced within a wide composition range (0.29 5 z 5 0.72). Our aim is to calculate the electrical resistivity e and its temperature coefficient 01 = de/(p dT) for Cu,All -, as a function of x.…”

Section: Introductionmentioning

confidence: 99%

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Electrical Resistivity Calculations for Amorphous Cu_xAl_1−x

Knuyt

1984

Physica Status Solidi (b)

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The electrical resistivity e and its temperature coefficient a are calculated for different compositions of the Cu,AlI -, amorphous alloy using a pseudopotential theory. The calculated resistivity e(z) agrees well with the experimental data when hybridization effects for copper are included. Different pseudopotentials are tested on their validity. The calculated a(%) curve does not reproduce the experimental Cu,AI1 -, data accurately, but has characteristics found in other experimental data. Finally a mechanism is suggested which can be responsible for the resistivity minimum a t low temperatures for amorphous alloys in certain cases.La rhsistivite 6lectrique e et son coefficient de temperature a ont &t& calcul6es pour differentes compositions de l'alliage amorphe Cu,AIl -, en usant une theorie de pseudopotentiel. La resistivite calculee e(z) est bien conforme aux points experimentaux si on tient compte avec des effects dhybridisation pour le cuivre. Des different5 pseudopotentials ont 6tB examines sur leur validit&. La fonction a(s) calculee ne reproduit pas precis6ment les points experimentaux, mais posshde des caracteristiques trouvkes pour des autres alliages amorphes. Finalement un mecanisme est suggere qui peut 6tre responsable du minimum dans la resistance Blcctrique ?A basse temperature pour certains alliages amorphes.

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Metastable phases in vapour‐quenched Al₇₈Cu₂₂ film

Yan

Gan

Wang³

1993

Annalen der Physik

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Abstract. The structure and structural changes of an A178C~22 (atolo) alloy film produced by coevaporation onto a cooled substrate have been investigated with transmission electron microscopy. A series of metastable phase transitions were observed during the crystallization from the as-deposited amorphous phase to the final equilibrium state. The deposit structure at room temperature consists of a mixture of fine grained a' crystallites (fcc, f = 4.81 A ) with an amorphous phase, and some welldefined crystals with an fcc lattice (a = 7.18 A, namely all. The subsequent annealing led to the grown crystals transforming to an ordered a' phase. It is argued that the development of such a transition is the result of a gradual atomic rearrangement -first topologically then a chemically predominant disorder-order transition.

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Superconducting amorphous Al?Cu films of high stability

Cited by 27 publications

References 17 publications

On Superconducting Transition Temperature in Amorphous Alloys of Simple Metals

On Superconducting Transition Temperature in Amorphous Alloys of Simple Metals

Electrical Resistivity Calculations for Amorphous Cu_xAl_1−x

Metastable phases in vapour‐quenched Al₇₈Cu₂₂ film

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Superconducting amorphous Al?Cu films of high stability

Cited by 27 publications

References 17 publications

On Superconducting Transition Temperature in Amorphous Alloys of Simple Metals

On Superconducting Transition Temperature in Amorphous Alloys of Simple Metals

Electrical Resistivity Calculations for Amorphous CuxAl1−x

Metastable phases in vapour‐quenched Al78Cu22 film

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Electrical Resistivity Calculations for Amorphous Cu_xAl_1−x

Metastable phases in vapour‐quenched Al₇₈Cu₂₂ film