Super-resolution near-field lithography using planar silver lenses: A review of recent developments

Blaikie, Richard J.; Melville, David O. S.; Alkaisi, Maan M.

doi:10.1016/j.mee.2006.01.056

Cited by 43 publications

(27 citation statements)

References 23 publications

(44 reference statements)

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“…Ultraviolet (UV) light is commonly used in such processes; however, the process scale is related to the wavelength of the radiation, and features with a scale smaller than the half wavelength might be blurred [12]. Numerous techniques have been developed for smaller scales (typically less than 100 nm), including X-ray, electron and ion beams [13]. These techniques still require beam absorption materials, as well as expensive processes [14].…”

Section: Review Of 3d Structuring Technologies At the Micro/nanoscalementioning

confidence: 99%

Hybrid 3D printing by bridging micro/nano processes

Yoon

Jang

Kim

et al. 2017

J. Micromech. Microeng.

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The aim of this work was to develop a novel hybrid manufacturing method for nanoscale three-dimensional (3D) printing with multi-material capabilities. 3D structuring methods at the micro/nanoscale are major goals of various engineering fields, and much work has been carried out to improve the minimum feature size, geometrical complexity, and material selection. With the aim of nanoscale multimaterial printing, a hybrid process was reported with an integrated nanoparticle deposition system (NPDS) and focused ion beam (FIB) system; however this process has limitations in terms of surface roughness and control over the layer thickness, as well as with the process scale, and furthermore, lack of sacrificial layers.In this dissertation, a novel hybrid process is described, which combines aerodynamically focused nanoparticle (AFN) printing, micro-machining and focused ion beam (FIB) milling. AFN printing is based on NPDS, and micromachining was used for local planarization. In addition to these processes, spincoating was used to fabricate sacrificial layers. By bridging these different II micro/nanoscale processes, the resulting hybrid process can address the limitations of the individual processes.To create the hybrid process, each process was investigated to enable compatibility. With the AFN printing system, the surface morphology of a detached substrate was observed, and the bonding mechanism between the substrate and nanoparticles was investigated. A novel printing strategy was identified to reduce the scale of the process. With the micro-machining system, different tool geometries were investigated. Complex geometries inspired by conventional-scale tools were implemented on the micro-scale, and their effects were investigated. With the FIB system, material re-deposition phenomena were investigated to reduce defects that occur during ion sputtering. A novel path-generation strategy was identified and investigated for different scanning paths.Process capability is discussed using fabrication examples and functional applications. The novel hybrid process represents a significant advance in the state of the art, and enables far improved process scales or dimensional degree of freedom, without losing the advantages of broad choice of materials.3D-pinted micro bi-material cantilevers were fabricated as a thermal actuator.The mechanical and thermal properties of the structure were investigated using an in-situ measurement system, and irregular thermal phenomena were analyzed. It is expected that these in-situ measurements of the 3D printed microstructure will contribute to materials research.Various 3D structures can be fabricated using the process described here from a range of metal/ceramic inorganic materials, including polymers. In particular, it is expected that the process will contribute to the area of customized nanoscale structuring, with potential applications in medical treatments. It is also expected that this work will contribute to further improvements in manufacturing technology by combining different m...

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Section: Review Of 3d Structuring Technologies At the Micro/nanoscalementioning

confidence: 99%

Hybrid 3D printing by bridging micro/nano processes

Yoon

Jang

Kim

et al. 2017

J. Micromech. Microeng.

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“…Numerical simulation shows that the smallest resolution that can be achieved using this method is 40 nm. A comparison between 50 nm single-and doublelayer lens with two 30-nm layers was made by Melville in 2005 [61]. Gratings with 170 nm period have been resolved for the double-layer lens.…”

Section: Planar Lens Imaging Nanolithographymentioning

confidence: 99%

Plasmonic Nanolithography: A Review

Xie

Wang

et al. 2011

Plasmonics

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Surface plasmon polaritons (SPPs) has attracted great attention in the last decade and recently it has been successfully applied to nanolithography due to its ability of beyond diffraction limit. This article reviews the recent development in plasmonic nanolithography, which is considered as one of the most remarkable technology for next-generation nanolithography. Nanolithography experiments were highlighted on the basis of SPPs effect. Three types of plasmonic nanolithography methods: contact nanolithography, planar lens imaging nanolithography, and direct writing nanolithography were reviewed in detail, and their advantages and shortages are analyzed and compared, respectively. Finally, the development trend of plasmonic nanolithography is suggested.

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“…It is not practical in real application by Fang's method of nanolithography because each wafer needs its respective mask. The experiments of super resolution using silver slab was reported, and the line width with one fifth of illumination wavelength can be successfully resolved by the silver slab (Blaikie et al, 2006). Though Blaikie's experiment made mask and silver integrity, they separated photoresist from silver slab.…”

Section: Nanolithography In the Evanescent Near Field By Using Nano-fmentioning

confidence: 99%