Super-low turn-on and threshold electric fields of plasma-treated partly Fe-filled carbon nanotube films

Gui, Xuchun; Wei, Jinquan; Wang, Kunlin; Xu, Eryang; Lv, Ruitao; Zhu, Di; Guo, Zhiying; Kang, Feiyu; Zhu, Yanqiu; Li, Dejie; Zhu, Hongwei; Wu, Dehai

doi:10.1016/j.materresbull.2010.01.015

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Cited by 3 publications

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“…Plasma treatment has been proven as an effective and efficient method to enhance the field emission performance of CNTs by changing the CNT morphology [31], alignment [32], structural defects [33], and work function [34]. Many types of plasma, such as H 2, Ar, CF 4 , N 2 , and O 2 [31][32][33][34][35][36], have been investigated.…”

Section: Introductionmentioning

confidence: 99%

Synthesis and Electron Emission Properties of Aligned Carbon Nanotube Arrays

Neupane¹

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Section: Introductionmentioning

confidence: 99%

Synthesis and Electron Emission Properties of Aligned Carbon Nanotube Arrays

Neupane¹

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An increase in the field emission from vertically aligned multiwalled carbon nanotubes caused by NH3 plasma treatment

Chen

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et al. 2013

Carbon

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Metal free, end-opened, selective nitrogen-doped vertically aligned carbon nanotubes by a single step in situ low energy plasma process

Iyer

Maguire

2011

J. Mater. Chem.

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We report a novel single step in situ process of growth and nitrogen-electron cyclotron resonance plasma treatment of vertically aligned multi walled carbon nanotubes (VA-MWCNTs) that leads to concurrent end opening by metal cap removal, nitrogen incorporation and intercalation along with substitution at graphitic sites resulting in n-type electronic doping. Microscopic and spectroscopic evaluations of the nitrogen treated MWCNTs reveal negligible iron content with significant conservation of both structure and alignment. The nitrogen induced electronic change increases distinct p* states as evidenced by Near Edge X-ray Absorption Fine Structure (NEXAFS) and 5 cm À1 downshift of G-band, as observed from Raman spectroscopy, confirm n-type doping. The combined effect of plasma activation (both cavities and surface of the end opened VA-MWCNTs) and n-type doping enhances the field emission performance of the CNTs resulting in high current density (15 mA cm À2) at low applied voltage of 1.5 V mm À1 with low turn on and threshold electric fields (E to-0.52 and E th-0.76 V mm À1). This low energy highly controllable plasma has great implications not only in the fabrication of various n-type materials and bio related application but also many other interesting areas for cost effective energy related applications.

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Super-low turn-on and threshold electric fields of plasma-treated partly Fe-filled carbon nanotube films

Cited by 3 publications

References 36 publications

Synthesis and Electron Emission Properties of Aligned Carbon Nanotube Arrays

Synthesis and Electron Emission Properties of Aligned Carbon Nanotube Arrays

An increase in the field emission from vertically aligned multiwalled carbon nanotubes caused by NH3 plasma treatment

Metal free, end-opened, selective nitrogen-doped vertically aligned carbon nanotubes by a single step in situ low energy plasma process

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