2022
DOI: 10.1002/aelm.202101215
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Subthreshold Swing of 59 mV decade−1 in Nanoscale Flexible Ultralow‐Voltage Organic Transistors

Abstract: Organic thin‐film transistors (TFTs) that provide subthreshold swings near the theoretical limit together with large on/off current ratios at very low operating voltages require high‐capacitance gate dielectrics with a vanishingly small defect density. A promising approach to the fabrication of such dielectrics at temperatures sufficiently low to allow TFT fabrication on polymeric substrates are hybrid dielectrics consisting of a thin metal oxide layer in combination with a molecular self‐assembled monolayer (… Show more

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Cited by 22 publications
(32 citation statements)
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“…The contact resistance of the DPh-DNTT TFTs fabricated by electron-beam lithography reported here is thus smaller than the contact resistance reported in about 80% of all previous publications in which the contact resistance of organic TFTs has been reported (7,45). It is, however, larger by about an order of magnitude than the contact resistance reported previously for DPh-DNTT TFTs fabricated by stencil lithography (7,8,42). The larger contact resistance of the TFTs fabricated by electronbeam lithography is possibly the result of contamination of the contact surfaces during the liftoff process that follows the electron-beam lithography process, and/or due to the relatively sharp edges of the contacts when these are patterned by electron-beam lithography, rather than stencil lithography (46).…”
Section: Contact Resistancecontrasting
confidence: 72%
“…The contact resistance of the DPh-DNTT TFTs fabricated by electron-beam lithography reported here is thus smaller than the contact resistance reported in about 80% of all previous publications in which the contact resistance of organic TFTs has been reported (7,45). It is, however, larger by about an order of magnitude than the contact resistance reported previously for DPh-DNTT TFTs fabricated by stencil lithography (7,8,42). The larger contact resistance of the TFTs fabricated by electronbeam lithography is possibly the result of contamination of the contact surfaces during the liftoff process that follows the electron-beam lithography process, and/or due to the relatively sharp edges of the contacts when these are patterned by electron-beam lithography, rather than stencil lithography (46).…”
Section: Contact Resistancecontrasting
confidence: 72%
“…To compare the performance of 1L‐C 6 ‐DNTT OFETs with reported OFETs, we hereby summarized the reported works with R c lower than 100 Ω cm in Figure a. [ 4,15,18,19,43–49 ] The high µ 0 of 10.9 ± 0.3 cm 2 V –1 s –1 and low R c of 28 ± 3 Ω cm of 1L‐C 6 ‐DNTT in this work appears at the lower right corner of Figure 4a, revealing a balanced overall improvement in these two critical figures of merits which is particularly desired for OFETs to transport high density of current.…”
Section: Resultsmentioning
confidence: 91%
“…Notably, the contact resistance study in the bottom-contact configuration is appealing and has achieved impressive progresses with thermally evaporated organic semiconductors. [1,2,40] The compatibility of solution shearing is limited by the crystal growth on the bottom-contact structure.…”
Section: Contact Resistance and Performance Prediction For Monolayer ...mentioning
confidence: 99%