2016 IEEE International Conference on Semiconductor Electronics (ICSE) 2016
DOI: 10.1109/smelec.2016.7573636
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Substrate effect on electrical properties of vanadium oxide thin film for Memristive device applications

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Cited by 5 publications
(2 citation statements)
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“…Pulsed laser deposition (PLD) technique is used for its uniform and stoichiometry deposition [8][9][10][11][12]. Nd-YAG laser at 355 nm is used to deposit a thin film onto the substrate, and the deposition is carried out in a chamber at oxygen (O 2 ) atmosphere [13][14][15][16][17][18][19][20].…”
Section: Methodsmentioning
confidence: 99%
“…Pulsed laser deposition (PLD) technique is used for its uniform and stoichiometry deposition [8][9][10][11][12]. Nd-YAG laser at 355 nm is used to deposit a thin film onto the substrate, and the deposition is carried out in a chamber at oxygen (O 2 ) atmosphere [13][14][15][16][17][18][19][20].…”
Section: Methodsmentioning
confidence: 99%
“…Vanadium dioxide (VO 2 ) is a transition metal oxide which finds use in various applications like thermochromic devices [1], micro-bolometer [2], IR-photodetector [3], metamaterial [4,5], smart windows [6,7], thermal switching [8], batteries [9,10], memristic devices [11], THz modulation devices [12] etc. It is been extensively studied due to its ability to undergo a first order phase transition accompanied by semiconductor-to-metal transition (SMT) at 68 °C (T SMT ).…”
Section: Introductionmentioning
confidence: 99%