2011
DOI: 10.1021/ma200113w
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Submicrometer Pattern Fabrication by Intensification of Instability in Ultrathin Polymer Films under a Water–Solvent Mix

Abstract: Dewetting of ultrathin (< 100 nm) polymer films, by heating above the glass transition, produces droplets of sizes of the order of microns and mean separations between droplets of the order of tens of microns. These relatively large length scales are because of the weak destabilizing van der Waals forces and the high surface energy penalty required for deformations on small scales. We show a simple, one-step versatile method to fabricate sub-micron (>~100 nm) droplets and their ordered arrays by room temperatu… Show more

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Cited by 49 publications
(75 citation statements)
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“…For low film thicknesses, we measured power laws for the dryspot density very similar to those found by others for polystyrene melts on silicon wafers [18][19][20]27]. For our material system of polar liquids on polycarbonate, the dry-spot density coincides with the most unstable wavelength predicted by linear stability analysis for a Van der Waals type disjoining pressure with a value of the Hamaker coefficient in agreement with the retarded version of the Tabor-Winterton approximation.…”
Section: Discussionsupporting
confidence: 84%
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“…For low film thicknesses, we measured power laws for the dryspot density very similar to those found by others for polystyrene melts on silicon wafers [18][19][20]27]. For our material system of polar liquids on polycarbonate, the dry-spot density coincides with the most unstable wavelength predicted by linear stability analysis for a Van der Waals type disjoining pressure with a value of the Hamaker coefficient in agreement with the retarded version of the Tabor-Winterton approximation.…”
Section: Discussionsupporting
confidence: 84%
“…7d illustrates a measurement close to that transition point. The power law N H $ h À4 min for low values of h min is close to the experimental observations on thin films of polystyrene on silicon wafers [18][19][20]22,27] and is consistent with our earlier analysis of 3EG on PC (see Fig. 6d for Re D > 100 in Ref.…”
Section: Film Rupture and Dry-spot Formationsupporting
confidence: 91%
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“…Thus, in the past decades, enormous experimental and theoretical endeavors have been made to improve the ordering degree of the dewetting-induced features. 9−12,14−28 Previously, three preferred strategies have been introduced for directing dewetting: chemically 14,15 or topographically patterned substrates [9][10][11][20][21][22][23][24][25]28 or externally structured templates. 16 −19 In the above directed dewetting, lithography-based techniques such as photolithography or e-beam etching have been directly or indirectly involved in the fabrication of the required patterned substrates and structured templates.…”
Section: ■ Introductionmentioning
confidence: 99%