In this work, we report the direct growth and characterization of a mid-wave infrared InAs/GaSb type-II superlattice n-B-p photodetector on GaAs substrate. The design consists of an n-doped contact, a wide bandgap unipolar barrier and a p-doped absorber, which uses photogenerated electron as minority carriers to enjoy the longer electron diffusion length as compared to hole diffusion length. At 77 K, the device exhibits a dark current density of 2.9×10-5 A/cm 2 under-0.1 V, and a zero-bias differential-resistance-area product (R0A) in excess of 8×10 3 Ω•cm 2. Arrhenius analysis of dark current demonstrates that the dominant mechanism is diffusion at temperature higher than 130 K. 50% cutoff wavelength of the detector is found at 6.4 µm at 77 K under zero bias, with a peak responsivity of 0.56 A/W. The corresponding specific detectivity is 7.6×10 11 cm•Hz 1/2 /W. Key device parameters which limit the further optimization of performance are discussed.