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2013
DOI: 10.1063/1.4772615
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Sub-250 nm light emission and optical gain in AlGaN materials

Abstract: Articles you may be interested inSub-250 nm room-temperature optical gain from AlGaN/AlN multiple quantum wells with strong band-structure potential fluctuations

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Cited by 24 publications
(7 citation statements)
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“…Indeed, their high crystalline quality, resulting from the absence of extended defects such as dislocations or grain boundaries, should allow NW-based UV-light emitting devices (LEDs) to reach higher internal quantum efficiency (IQE) than their two-dimensional (2D) counterparts. High-efficiency UV-LEDs based on AlGaN and AlN NWs, with an IQE of 80% for AlN NW emitting at 210 nm, have been demonstrated recently, whereas significantly lower IQEs have been reported so far in the 2D case, especially for short emission wavelengths. It must be noted that efficiency improvement when using III-nitride alloy NWs is expected to be lower for the visible range, as conventional LEDs based on 2D heterostructures with In x Ga 1– x N (InGaN) already exhibit high IQEs attributed to very marked carrier localization in this alloy …”
mentioning
confidence: 99%
“…Indeed, their high crystalline quality, resulting from the absence of extended defects such as dislocations or grain boundaries, should allow NW-based UV-light emitting devices (LEDs) to reach higher internal quantum efficiency (IQE) than their two-dimensional (2D) counterparts. High-efficiency UV-LEDs based on AlGaN and AlN NWs, with an IQE of 80% for AlN NW emitting at 210 nm, have been demonstrated recently, whereas significantly lower IQEs have been reported so far in the 2D case, especially for short emission wavelengths. It must be noted that efficiency improvement when using III-nitride alloy NWs is expected to be lower for the visible range, as conventional LEDs based on 2D heterostructures with In x Ga 1– x N (InGaN) already exhibit high IQEs attributed to very marked carrier localization in this alloy …”
mentioning
confidence: 99%
“…We did not observe any Al clustering or compositional fluctuations as reported previously. 18 Details on AlN substrate preparation and MOCVD growth process can be found elsewhere. 19 Laser cavities were obtained by cleaving along the m-facet of the AlN wafer.…”
mentioning
confidence: 99%
“…In fact, room-temperature lasing at deep-UV wavelengths down to 214 nm has already been demonstrated with high-quality AlN layers using optical pumping [231]. Optical gain at wavelengths below 250 nm has also been measured with the variable-stripe-length method in AlGaN/AlN QWs featuring strong band-structure potential fluctuations [210,211,237], grown by plasma-assisted MBE under Ga-rich conditions as described previously in this article. Due to their advanced level of development and wide range of applications, a comprehensive description of III-nitride diode lasers is beyond the scope of this review.…”
Section: Lasersmentioning
confidence: 87%