SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography

Campo, Aránzazu del; Greiner, Christian

doi:10.1088/0960-1317/17/6/r01

Cited by 729 publications

(544 citation statements)

References 145 publications

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“…2) utilizing multi-layered SU-8 epoxy based negative photoresist [13,14,15] as a master replica for PDMS moulding [3]. The SU-8 layers were patterned by subsequent spin-coatings and lithographic exposures and a final development step.…”

Section: Microfabricationmentioning

confidence: 99%

PDMS microfluidics developed for polymer based photonic biosensors

et al. 2014

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Abstract:In this work, advances in the fabrication technology and functional analysis of a polymer microfluidic system -as a significant part of a developed polymer photonic biosensor -are reported. Robust and cost-effective microfluidics in PDMS including sample preparation functions is designed and realized by using SU-8 moulding replica. Surface modification strategies using Triton X-100 and PDMS-PEO and their effect on device sealing and non-specific protein adsorption are investigated by contact angle measurement and in situ fluorescence microscopy.Response to Reviewers: Dear Editors and Reviewers, First of all, thank You for the effort in improving our paper. Regarding the reviewer comments, we made the following modifications regarding the latest version of the manuscript submitted. The modifications and the required supplements are submitted in pdf format with the revised manuscript.Thank You again for the efforts to improve our manuscript. Regards, Péter Fürjes

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Section: Microfabricationmentioning

confidence: 99%

PDMS microfluidics developed for polymer based photonic biosensors

et al. 2014

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“…SU8 is a commonly used negative resist for the fabrication of sub-micron scale structures based on a novolak epoxy resin [1] and is capable of producing structures of high aspect ratios [2]. The versatility of SU8 is highlighted by the range of applications for which it can be used.…”

Section: Introductionmentioning

confidence: 99%

Lithographically fabricated SU8 composite structures for wettability control

Hamlett

McHale

Newton

2014

Surface and Coatings Technology

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SU8 is a negative resist which is widely used for the fabrication of micron scale lateral features over a wide range of heights using photolithographic methods. This has been extensively used as a method to produce surface structure to which hydrophobicity can be added and a model super-water repellent surface of achieved. However, such an approach requires at least two-steps and does not embed the desired properties as part of the structure itself or create multiple levels of topographical structure. In other applications, a variety of inclusions have previously been studied to tailor the properties of SU8. In this work we report an approach to, and results from, incorporating inclusions, in our case glass beads, of different wettabilities into the SU8 structures produced by photolithography. In particular, we focus on ridge structures expected to be of use in flow systems as drag reducing surfaces. We used scanning electron microscopy and profilometry to investigate how the inclusion of either hydrophobic or hydrophilic glass beads (sieve size of 20-30 μm) affects the definition of the structures formed and contact angle goniometry to define what effect such inclusions has on the wettability of the SU8 composite structure. It was found that the inclusion of hydrophobic glass beads in the SU8 resist resulted in poorly defined structures compared to both SU8 on its own and SU8 to which hydrophobic glass beads were added. In contrast, inclusion of hydrophilic glass beads resulted in a well-defined ridge structure with the majority of the beads located in the 'valleys'. Both EDX analysis and contact angle data indicated that the surface chemistry of the beads themselves (both the hydrophobic and hydrophilic beads) were masked by the SU8. Counter-intuitively, the inclusion of hydrophobic beads in the SU8 composite resin resulted in ridges with increased wettability, compared to SU8 ridges, as opposed to the inclusions of hydrophilic beads that resulted in surfaces with increased effective hydrophobicity .2

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“…The polymer matrix SU-8 is an epoxy-based negative photoresist capable of being fabricated into high aspect ratio microstructures [14]. SU-8 exhibits excellent chemical stability and excellent mechanical properties [14].…”

Section: Introductionmentioning

confidence: 99%

“…SU-8 exhibits excellent chemical stability and excellent mechanical properties [14]. SU-8 is not considered fully biocompatible according to ISO 10993, however, investigations show that toxicity derived from its degradation products is very low [15].…”

Section: Introductionmentioning

confidence: 99%

A photopatternable superparamagnetic nanocomposite: Material characterization and fabrication of microstructures

Suter

Ergeneman

Zürcher

et al. 2011

Sensors and Actuators B: Chemical

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A superparamagnetic nanocomposite obtained by dispersing superparamagnetic magnetite nanoparticles in the epoxy SU-8 is used to fabricate microstructures by photolithography. The dispersion of the nanoparticles and the level of agglomerations are analyzed by optical microscopy, TEM (transmission electron microscope), SAXS (small-angle X-ray scattering), XDC (X-ray disc centrifuge) and XRD (X-ray diffraction). Two different phosphate-based dispersing agents are compared. In order to obtain a high-quality nanocomposite, the influence of particle concentration 1-10 vol.% (4-32 wt.%) on composite fabrication steps such as spin coating and UV exposure are systematically analyzed. Features with narrow widths (down to 1.3 m) are obtained for composites with 5 vol.% particle concentration. Mechanical, magnetic and wetting properties of the nanocomposites are characterized. These nanocomposites exhibit superparamagnetic properties with a saturation magnetization up to 27.9 kA m −1 for10 vol.%. All nanocomposites show no differences in surface polarity with respect to pure SU-8, and exhibit a moderate hydrophobic behavior (advancing dynamic contact angles approximately 81 • ). Microcantilevers with particle concentrations of 0-5 vol.% were successfully fabricated and were used to determine the dynamic Young's modulus of the composite. A slight increase of the Young's modulus with increased particle concentration from 4.1 GPa (pure SU-8) up to 5.1 GPa (for 5 vol.%) was observed.

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SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography

Cited by 729 publications

References 145 publications

PDMS microfluidics developed for polymer based photonic biosensors

PDMS microfluidics developed for polymer based photonic biosensors

Lithographically fabricated SU8 composite structures for wettability control

A photopatternable superparamagnetic nanocomposite: Material characterization and fabrication of microstructures

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