Study on Uniform Plasma Generation Mechanism of Electron Cyclotron Resonance Etching Reactor

Boundary effect on mode transformation in an electron cyclotron resonance etching reactor

“…Note that in the higher microwave power, density shows a peaked radial profile due to the strong power absorption underneath the quartz glass window (not shown). 3) Cases of the lower or the higher microwave power than the present one with a good uniform density profile will be discussed in a separate paper.…”

“…To the inner wall of the reactor by the plasma can be minimized because the plasma generation region can be located away from the reactor wall. (4) Uniform plasma generation Uniform plasma generation can be achieved to the extent that can be used as a semiconductor manufacturing tool for large wafers such as a diameter of 300 mm because of microwave propagation characteristics as described elsewhere 3) and later in Sect. 3.4.…”

“…Here, we have already reported that microwave analysis in the ECR reactor could be successfully performed in high spatial resolution 22) and the plasma distribution in the reactor could be reproduced quantitatively compared with the experimental result, by integration analyses of microwave, plasma generation, and plasma diffusion. 3) In this paper, we investigated the microwave electromagnetic field distribution in the ECR reactor by using the result of the simulation considering the plasma distribution and the wall effect. Moreover, by using theoretical analysis of plasma waveguide considering the wall effect, which is essential, and plasma distribution, we investigated how the microwaves propagate and are absorbed in the ECR reactor.…”

“…Here, using this scheme, we confirmed that the plasma density on the wafer electrode of the converged solution represents the measured value quantitatively, in addition to the excellent spatial resolutions. See the previous papers 3,22) for further details.…”

Ion energy distribution functions in a dual-frequency low-pressure capacitively-coupled plasma: experiments and particle-in-cell simulation

“…Significant effort and progress have been made to improve plasma models over the past few decades. A hybrid fluid-kinetic model that treats thermalized electrons as fluid while capturing the kinetic behavior of non-thermalized electrons and ions using a Monte Carlo collision (MCC) model has been successfully used for fundamental investigations and equipment design over a wide range of process conditions, such as two-dimensional inductively coupled plasma reactors [12][13][14], CCP [3,15,16], magnetically enhanced reactive ion etching [17,18], electron cyclotron resonance [19,20], and electron beam generated plasma [21]. It is thus the most popular and preferable tool for plasma system design due to its capabilities of handling comprehensive processing conditions, realistic plasma chemistry, and complicated but flexible geometry with moderate computational resources.…”