Study on the anti‐reflection and structure evolution of hydrogenated amorphous carbon grown by plasma chemical vapor deposition

Abstract

In this work, the interrelation between the anti‐reflective property and the component, especially the sp2 content, was studied. The results showed that the refraction index n increased from 2.2 to 3.3 with the direct current negative bias increasing. The reflection result R successful fall by 11.9% because of the existence of hydrogenated amorphous carbon anti‐reflective coatings. Both the refraction index and reflectivity decreasing correspond to a more graphitic microstructure character. Moreover, the optical property evolution of the films was explained by the chemical vapor deposition mechanism based on the ion sub‐plantation model and two‐phase model. Copyright © 2014 John Wiley & Sons, Ltd.