In this work, we developed a simulation model for plasma-enhanced chemical reaction in dielectric barrier discharge (DBD) in consideration of filamentary microdischarge formation. The first stage is the calculation of single filamentary microdischarge developed in DBD with parallel plate geometry using the fluid model. The second stage is the calculation of chemical processes with a set of rate equations using the radical production yield obtained in the filamentary microdischarge calculation. This model was applied to the NO oxidation process, which is often important in NO x removal using gas discharges, in atmospheric pressure N 2 /O 2 /NO mixtures under various discharge conditions. The calculated NO oxidation property has a quantitatively good agreement with the experimental one under wide discharge conditions. Therefore, the method used in this work is valid for the prediction of chemical processes in DBD. We also discuss the effect of gas temperature and gas residence time on NO oxidation.