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2013
DOI: 10.1016/s1002-0721(12)60254-3
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Study on purification and application of novel precipitant for ceria-based polishing powder

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Cited by 14 publications
(3 citation statements)
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“…Currently, the commonly used preparation method of ceria-based abrasives mainly includes three processes, which are precipitation, fluorination, and calcination [ 14 , 15 , 16 ]. However, high-precision classification is adopted to reasonably control the size of ceria-based abrasives [ 17 , 18 ].…”
Section: Introductionmentioning
confidence: 99%
“…Currently, the commonly used preparation method of ceria-based abrasives mainly includes three processes, which are precipitation, fluorination, and calcination [ 14 , 15 , 16 ]. However, high-precision classification is adopted to reasonably control the size of ceria-based abrasives [ 17 , 18 ].…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3][4] It is widely used as various silica-containing glass materials because of their unique mechanical and chemical polishing performance. [5][6][7][8] Usually, the cutting efficiency of pure CeO 2 is lower than that of ceria-based compounds added with La. [9][10][11] With the development of the precision optics industry and the emergence of new applications, the requirements for a neat nish of the glass surfaces are getting more stringent.…”
Section: Introductionmentioning
confidence: 99%
“…At present it has been widely used in chemicalmachine polishing(CMP),catalysts,ultravioletblocker, opticaldevices, ceramic, fuel cells and so on. Because of itsexcellent cutting ability, short polishing time, high polishingprecision, clean operating environment, and better effect compared with the other polishing powders [1,2], cerium oxideis especially considered candidate in the field of CMP.…”
Section: Introductionmentioning
confidence: 99%