Study on preparation and characters of one multi-function SiO2 film

Wang, Jizhou; Xiong, Yuqing; Wang, Duoshu; Hong-kai, Liu

doi:10.1016/j.phpro.2011.06.072

Cited by 6 publications

(2 citation statements)

References 2 publications

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“…The adhesion studies of the SiO 2 layer deposition using the sol-gel method were also carried out [22]. On the basis of the results, greater critical force causing delamination using the sol-gel method was carried out.…”

Section: Resultsmentioning

confidence: 99%

Effect of thin SiO₂ layers deposited by means of atomic layer deposition method on the mechanical and physical properties of stainless steel

Basiaga

Walke

Antonowicz

et al. 2018

Materialwissenschaft Werkst

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The aim of this study was to assess the suitability of the atomic layer deposition method in terms of using it for 316 LVM (low carbon vacuum melt) steel surface modification that is used for blood‐contacting implants in determined technological conditions. As part of a suitability assessment of thin layer deposition technology, the performance of mechanical and physical properties testing was proposed. The investigation influences the evaluation of the analysed material in the cardiovascular system's behavior used for blood. 316 LVM stainless steel was the initial material to be tested. The 316 LVM steel was subjected to the following surface modifications: electrolytic polishing, chemical passivation and deposition of a silicon dioxide (SiO2) layer using the atomic layer deposition method. The layer was applied at a variable thickness depending on the atomic layer deposition process, at constant temperature. In terms of mechanical properties, the analyzing adhesion of applied layers to the metallic base and its hardness were examined. What is more, during the evaluation of physical properties, testing of surface wettability was performed, which has a fundamental significance in case of implants used in the cardiovascular system. The obtained results have direct impact on optimization process of SiO2 layers deposition with atomic layer deposition method on blood‐contacting implants, which surface was made of steel 316 LVM, there by resulting in their have a direct impact functional properties improvement.

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Section: Resultsmentioning

confidence: 99%

Effect of thin SiO₂ layers deposited by means of atomic layer deposition method on the mechanical and physical properties of stainless steel

Basiaga

Walke

Antonowicz

et al. 2018

Materialwissenschaft Werkst

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show abstract

“…Because of its stability, amorphous nature, high density, adjustable refractive index, and low particulate contamination, SiO 2 has many typical applications, including in high-reflection coatings, antireflection coatings, all-dielectric mirrors, beam dividers, bandpass filters, and polarizers [1][2][3][4]. Several different deposition methods have been tried to get high-quality SiO 2 films, including ion beam sputtering (IBS) [5], ion beam assisted deposition (IBAD) [6], molecular beam epitaxy (MBE) [7], RF magnetron sputtering [8], plasma-enhanced chemical vapor deposition (PECVD) [9], and reactive pulsed laser deposition (RPLD) [10]. IBS is one of the best deposition methods for preparing high-performance (low loss, low scattering, low absorption, stable structure) optical coatings.…”

Section: Introductionmentioning

confidence: 99%

Optical and interfacial layer properties of SiO₂ films deposited on different substrates

Jiang

Liu²,

Wang³

et al. 2013

Appl. Opt.

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SiO2 films were deposited on fused silica, silicon, glass, germanium, and sapphire substrates by an ion beam sputtering technique. The optical properties of SiO2 films on different substrates and interfacial layer properties between SiO2 films and different substrates were researched by the spectroscopic ellipsometry technique. The refractive indices of SiO2 films deposited on different substrates are about 1.477 at the wavelength of 632.8 nm. The optical anisotropy property of SiO2 films on fused silica substrate is the best. The impact of thermal treatment on surface roughness and interfacial layer properties between SiO2 films and Si substrates were also investigated. When the annealing temperature is 550°C, the least surface thickness and thinnest interface layer thickness between v films and silicon substrate can be achieved. The results indicate that the surface and interface layer properties between SiO2 films and silicon substrate can be greatly improved when the optimum annealing temperature is selected.

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Structural and optical characterization of SiO2 under irradiation with swift heavy ions

Yin

Zhang

Yan-cheng

et al. 2014

Nuclear Instruments and Methods in Physics Research Section B:

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Study on preparation and characters of one multi-function SiO2 film

Cited by 6 publications

References 2 publications

Effect of thin SiO₂ layers deposited by means of atomic layer deposition method on the mechanical and physical properties of stainless steel

Effect of thin SiO₂ layers deposited by means of atomic layer deposition method on the mechanical and physical properties of stainless steel

Optical and interfacial layer properties of SiO₂ films deposited on different substrates

Structural and optical characterization of SiO2 under irradiation with swift heavy ions

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Study on preparation and characters of one multi-function SiO2 film

Cited by 6 publications

References 2 publications

Effect of thin SiO2 layers deposited by means of atomic layer deposition method on the mechanical and physical properties of stainless steel

Effect of thin SiO2 layers deposited by means of atomic layer deposition method on the mechanical and physical properties of stainless steel

Optical and interfacial layer properties of SiO2 films deposited on different substrates

Structural and optical characterization of SiO2 under irradiation with swift heavy ions

Contact Info

Product

Resources

About

Effect of thin SiO₂ layers deposited by means of atomic layer deposition method on the mechanical and physical properties of stainless steel

Effect of thin SiO₂ layers deposited by means of atomic layer deposition method on the mechanical and physical properties of stainless steel

Optical and interfacial layer properties of SiO₂ films deposited on different substrates