Study on interfacial interaction energy of Cu–SAM–epoxy systems in a hot and humid environment

Xin, Dongrong; Han, Qiang

doi:10.1080/01694243.2013.837570

Cited by 2 publications

(1 citation statement)

References 15 publications

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“…In addition, the unshared electron pair of the cyano group allows for an increased reactivity toward molecular layer deposition . Cyano-terminated SAMs increase the surface energy of the low- k materials as compared with the originally hydrophobic −CH 3 functionality, improving the adhesion between the dielectric and the metal barrier. , In our recent publications, , CN-SAMs were deposited from the liquid and vapor phase on a porous low- k dielectric film activated by Ar/H 2 and Ar/N 2 plasma. Nevertheless, in both cases, despite the successful sealing, the film’s dielectric constant increased by 35% and 7% after Ar/N 2 and Ar/H 2 plasma preactivation followed by CN-SAM deposition.…”

Section: Introductionmentioning

confidence: 99%

Impact of Plasma Pretreatment and Pore Size on the Sealing of Ultra-Low-k Dielectrics by Self-Assembled Monolayers

et al. 2014

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Self-assembled monolayers (SAMs) from an 11-cyanoundecyltrichlorosilane (CN-SAM) precursor were deposited on porous SiCOH low-k dielectrics with three different pore radii, namely, 1.7, 0.7, and lower than 0.5 nm. The low-k dielectrics were first pretreated with either O2 or He/H2 plasma in order to generate silanol groups on the hydrophobic pristine surface. Subsequently, the SAMs were chemically grafted to the silanol groups on the low-k surface. The SAMs distribution in the low-k films depends on the pore diameter: if the pore diameter is smaller than the size of the SAMs precursors, the SAM molecules are confined to the surface, while if the pore diameter exceeds the van der Waals radius of the SAMs precursor, the SAMs molecules reach deeper in the dielectric. In the latter case, when the pore sidewalls are made hydrophilic by the plasma treatment, the chemical grafting of the SAM precursors follows the profile of the generated silanol groups. The modification depth induced by the O2 plasma is governed by the diffusion of the oxygen radicals into the pores, which makes it the preferred choice for microporous materials. On the other hand, the vacuum ultraviolet (VUV) light plays a critical role, which makes it more suitable for hydrolyzing mesoporous materials. In addition to the density of the surface -OH groups, the nanoscale concave curvature associated with the pores also affects the molecular packing density and ordering with respect to the self-assembly behavior on flat surfaces. A simple model which correlates the low-k pore structure with the plasma hydrophilization mechanism and the SAMs distribution in the pores is presented.

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