Study on formation and shape of carbon nanotips depending on ion bombardment

Analysis of photoluminescence background of Raman spectra of carbon nanotips grown by plasma-enhanced chemical vapor deposition

“…18,19,38,39 Here we will discuss the origin of the difference of the Raman spectra generated by different CNTPs and the plain carbon films.…”

“…After the production of the plasma, ammonia can be dissociated and ionized and various nitrogenous ions can be formed in the cathode sheath. 38,42 Moreover, a relatively strong electric field forms near the substrate surface. Because of this strong electric field, it is possible that some energetic nitrogenous ions are implanted into the subsurface layers of the CNTPs or interact with the carbon atoms on the CNTP surfaces to form various carbon nitride structures.…”

Comparative study on catalyst-free formation and electron field emission of carbon nanotips and nanotubes grown by chemical vapor deposition

“…According to the relation of sputtering yield with incident angle, the sputtering is very weak when the incident angle approaches /2 [19]. The formation of aligned carbon nanotube walls generates an incident angle of about /2, thereby the sputtering for the carbon nanotubes is very weak [19]. However, the cone-type structure of carbon nanotips makes the incident angle reduce and thus improves the sputtering [19].…”

“…The formation of aligned carbon nanotube walls generates an incident angle of about /2, thereby the sputtering for the carbon nanotubes is very weak [19]. However, the cone-type structure of carbon nanotips makes the incident angle reduce and thus improves the sputtering [19]. Therefore, Fig.…”

“…Owing to the difference in the morphologies of carbon nanotips and nanotubes, there is a great difference in the sputtering-etching because the sputtering is related to the incident angle (the angle of the incoming ion to the surface normal). According to the relation of sputtering yield with incident angle, the sputtering is very weak when the incident angle approaches /2 [19]. The formation of aligned carbon nanotube walls generates an incident angle of about /2, thereby the sputtering for the carbon nanotubes is very weak [19].…”