Study on Fabrication of X-ray Collimators by X-ray Lithography Using Synchrotron Radiation

Saegusa, Shunya; Narukage, Noriyuki; Utsumi, Yuichi; Yamaguchi, Akinobu

doi:10.2494/photopolymer.34.213

Cited by 3 publications

(3 citation statements)

References 20 publications

(20 reference statements)

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“…If we carry out calculations using formula (5), then for segments of 50 µm and a distance of 40 mm till the photoresist, we should obtain an imprint size of ∼11.5 µm. The experimental imprint size of segments is 3.5-5.5 µm, i.e.…”

Section: Test Of Rxms With Synchrotron Radiationmentioning

confidence: 99%

“…It provides new possibilities for creating micro-devices (MEMS and MOEMS) with a high aspect ratio in thick (∼1 mm) resists with almost vertical sidewalls [3], offering various resist illumination techniques (dynamic, maskless, interference ones, etc). Many x-ray optical elements, such as x-ray refractive lenses [4], collimators [5], and diffraction gratings [6] are manufactured by this technique. Diffraction gratings in particular have found applications in many fields such as medicine, tomography, biology [7,8], and XRL has the potential to fabricate about 1 µm linewidth gratings [9].…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Reflective x-ray masks for x-ray lithography

Chumak,

Peredkov,

Devizenko

et al. 2024

J. Micromech. Microeng.

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Application of X-ray multilayers as reflective X-ray masks (RXMs) for X-ray lithography is proposed. The mask is a specially prepared multilayer mirror capable to selectively reflect X-rays. The use of grazing geometry allows a pattern design on the mask to be compressed in one direction. Application examples are given for the masks (WC/Si multilayers) with two types of a radiation source: an X-ray tube (λ=0.154 nm) and a synchrotron (λ~0.35 nm). The compression of the mask segments by 14-30 times with the imprint size in the resist plane 3.5-4 μm is obtained. The advantages of the proposed masks are given. The possibilities of obtaining submicron imprints are discussed.

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Section: Test Of Rxms With Synchrotron Radiationmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Reflective x-ray masks for x-ray lithography

Chumak,

Peredkov,

Devizenko

et al. 2024

J. Micromech. Microeng.

View full text Add to dashboard Cite

show abstract

“…Some of them have been addressed. For example, both diffraction and penumbral blur depend on the gap between the mask and the resist, and its minimization by making hard contact was investigated by Saegusa et al (Saegusa, et al, 2021).…”

Section: X-ray Interference Lithographymentioning

confidence: 99%

X-Ray Lithography for Nanofabrication: Is There a Future?

Bharti

Turchet

Marmiroli

2022

Front. Nanotechnol.

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X-ray lithography has been first proposed almost 50 years ago, and the related LIGA process around 25 years ago. It is therefore a good time to make an analysis of the technique, with its pros and cons. In this perspective article, we describe X-ray lithography’s latest advancements. First, we report the improvement in the fabrication of the high aspect ratio and high-resolution micro/nanostructures. Then, we present the radiation-assisted synthesis and processing of novel materials for the next generation of functional devices. We finally draw our conclusion on the future prospects of the technique.

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X-ray multi-scale microfabrication system and x-ray imaging evaluation system all in one beamline

Yamamoto,

Utsumi,

Sakurai

et al. 2023

Journal of Vacuum Science &Amp; Technology B

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We have completed a system that can achieve both deep x-ray lithography and submicron x-ray lithography with a single beamline by introducing the combination of x-ray plane and cylindrical mirrors. This x-ray lithography system can provide a large-scale microfabrication processing with 210 × 300 mm2 (A4 size). To exploit multiscale lithography, the beamline has a beam transport vacuum duct with a two-stage stacked structure and a 5-axis stage. This two-stage stacked structure allows us to fabricate both micron scale structures with high aspect ratios and submicron scale structures using the same beamline. In addition, x-ray imaging and computer tomography (CT) system are connected to the x-ray lithography system for nondestructive inspection and evaluation of the fabricated microstructures. The x-ray imaging system constructed this study has a relatively low energy range of x-ray energy in the beamline, which is in the range of 2–15 keV or less. Therefore, relatively good absorption contrast can be obtained for plastic materials, biomaterials, and the like. Since nondestructive imaging of the processed shape by x-ray lithography is possible, it is a very useful system in processing and evaluation can be performed simultaneously. This system also enables us to obtain the live images with keeping the creature alive in liquid using an indirect x-ray imaging system which converts x-ray images to visible light images through the fluorescent plate.

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Study on Fabrication of X-ray Collimators by X-ray Lithography Using Synchrotron Radiation

Cited by 3 publications

References 20 publications

Reflective x-ray masks for x-ray lithography

Reflective x-ray masks for x-ray lithography

X-Ray Lithography for Nanofabrication: Is There a Future?

X-ray multi-scale microfabrication system and x-ray imaging evaluation system all in one beamline

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