2007
DOI: 10.1016/j.physleta.2006.10.082
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Study on electron beam emission from a low energy plasma focus device

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Cited by 33 publications
(14 citation statements)
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“…The maximum x-rays yield of about 4.7 J is estimated in 4-geometry at 1.5 mbar argon with 0.09% efficiency. The pressure dependence of hard x-rays emission points to the existence of e-beam, which decreases with pressure as observed by the Neog et al 18 who made direct measurements of the electron beam current and have found this behavior with pressure. Figure 4 exhibits the pinhole images of x-ray emission zones recorded on Fuji medical x-ray film by masking pinholes separately with Ag ͑50 m͒ and Ta ͑53 m͒ filters at optimum pressure.…”
supporting
confidence: 61%
“…The maximum x-rays yield of about 4.7 J is estimated in 4-geometry at 1.5 mbar argon with 0.09% efficiency. The pressure dependence of hard x-rays emission points to the existence of e-beam, which decreases with pressure as observed by the Neog et al 18 who made direct measurements of the electron beam current and have found this behavior with pressure. Figure 4 exhibits the pinhole images of x-ray emission zones recorded on Fuji medical x-ray film by masking pinholes separately with Ag ͑50 m͒ and Ta ͑53 m͒ filters at optimum pressure.…”
supporting
confidence: 61%
“…The earlier studies on the low energy PF devices, similar to the device used in this paper, showed that the electron beam output has strong correlation with the general plasma dynamics Neog and Mohanty 2007;Zhang et al 2007). The correlation starts from the breakdown through the radial phase.…”
Section: Discussionmentioning
confidence: 57%
“…The plasma produced is of very high temperature (1-3 keV) and high density (>10 19 Particles/cm 3 ) [1]. The device is particularly interesting due to its special characteristic as intense pulsed sources of X-rays, ions, electrons and neutrons (deuterium filling) [2][3][4][5]. The early research was concentrated on the neutron emission [6,7] and yet in recent years, there is abrupt growth of researcher's interest in utilized plasma focus for its application in surface modification [8], ion implantation [9] and thin film deposition [10].…”
Section: Introductionmentioning
confidence: 99%