“…However, there exist many problems for these thin films, such as the composition discrepancy between the target and the thin films (i.e., serious Zn-loss), and oxygen-vacancies [6,7]. Taking into account that a major barrier in the widespread use of these thin films in a number of high-frenquency applications is their high leakage currents determined by structural defects like grain boundaries and oxygen vacancies [2,4,[8][9][10][11][12][13][14], it is urgent for researchers to prepare a dense thin film with high crystalline quality. Therefore, in this article, a Zn-enriched target comprised of a homogeneous mixture of 1 mol (Ba 0.3 Sr 0.7 )(Zn 1/3 Nb 2/3 )O 3 and 1 mol ZnO was utilized to compensate the volatilization of ZnO during the process of sputtering and annealing [6,7], next, the ceramic thin films on SiO 2 (110) substrates were prepared by radio frequency (RF) magnetron sputtering, and the effects of substrate temperatures on the microstructures, morphologies, grain sizes, RMS roughness values and chemical compositions of the thin films were studied in detail as a progress report of the results published previously in the other paper [15].…”